Invention Application
- Patent Title: DROPLET GENERATOR FOR LITHOGRAPHIC APPARATUS, EUV SOURCE AND LITHOGRAPHIC APPARATUS
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Application No.: US16061847Application Date: 2016-12-15
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Publication No.: US20180364580A1Publication Date: 2018-12-20
- Inventor: Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Koen Gerhardus Winkels , Theodorus Wilhelmus Driessen , Georgiy O. Vaschenko , Peter Michael Baumgart , Wilhelmus Henricus Theodorus Maria Aangenent , Jan Okke Nieuwenkamp , Wim Ronald Kampinga , Jari Ruotsalainen
- Applicant: ASML Netherlands B.V.
- International Application: PCT/EP2016/081161 WO 20161215
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00

Abstract:
Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.
Public/Granted literature
- US10481498B2 Droplet generator for lithographic apparatus, EUV source and lithographic apparatus Public/Granted day:2019-11-19
Information query
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