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1.发明授权公开(公告)号：US10401743B2
公开(公告)日：2019-09-03
申请号：US15735956
申请日：2016-05-19
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Johannes Theodorus Hendrikus De Best , Wilhelmus Henricus Theodorus Maria Aangenent , Stan Henricus Van Der Meulen
Abstract: A control system configured to control a parameter of a dynamic system, wherein the parameter depends on an output signal. The control system comprises a set-point generator and a feedforward, wherein the set-point generator is arranged to provide a set-point signal to the feedforward. The feedforward is arranged to provide the output signal based on the set-point signal, wherein the feedforward is arranged to perform a non-linear operation on the set-point signal. The non-linear operation is based on a non-linear functional relationship between the output signal and the parameter.
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公开(公告)号：US09897926B2
公开(公告)日：2018-02-20
申请号：US15115876
申请日：2015-01-20
Applicant: ASML Netherlands B.V.
Inventor： Wilhelmus Henricus Theodorus Maria Aangenent , Lucas Franciscus Koorneef , Theo Anjes Maria Ruijl , Stanley Constant Johannes Martinus Van Den Berg , Stan Henricus Van Der Meulen , Jan Van Eijk , Pieter Hubertus Godefrida Wullms , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70716 , G03F7/70758 , G03F7/709 , H01L21/68
Abstract: A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.
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公开(公告)号：US10481498B2
公开(公告)日：2019-11-19
申请号：US16061847
申请日：2016-12-15
Applicant: ASML Netherlands B.V.
Inventor： Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Koen Gerhardus Winkels , Theodorus Wilhelmus Driessen , Georgiy O. Vaschenko , Peter Michael Baumgart , Wilhelmus Henricus Theodorus Maria Aangenent , Jan Okke Nieuwenkamp , Wim Ronald Kampinga , Jari Ruotsalainen
Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.
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公开(公告)号：US10750604B2
公开(公告)日：2020-08-18
申请号：US15781885
申请日：2016-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Frederik Dijksman , Wilhelmus Henricus Theodorus Maria Aangenent , Ronald Johannes Hultermans , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Peter Wilhelm Hendrik Van Putten
IPC: H05G2/00
Abstract: An EUV source for generating a beam of EUV radiation, has a droplet generator with a nozzle assembly to emit droplets of fuel from a nozzle towards a plasma formation location. The nozzle assembly receives the fuel from a reservoir. The nozzle assembly has a pump chamber receiving the fuel from the reservoir and an actuator to vibrate a membrane that forms a wall of the pump chamber. The wall is oriented perpendicularly to a direction wherein the nozzle emits the fuel. The nozzle assembly has first and second nozzle filters non-adjacently arranged in series in a path of the fuel from the pump chamber to the nozzle.
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5.发明授权公开(公告)号：US10365567B2
公开(公告)日：2019-07-30
申请号：US15735956
申请日：2016-05-19
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Johannes Theodorus Hendrikus De Best , Wilhelmus Henricus Theodorus Maria Aangenent , Stan Henricus Van Der Meulen
Abstract: A control system configured to control a parameter of a dynamic system, wherein the parameter depends on an output signal. The control system comprises a set-point generator and a feedforward, wherein the set-point generator is arranged to provide a set-point signal to the feedforward. The feedforward is arranged to provide the output signal based on the set-point signal, wherein the feedforward is arranged to perform a non-linear operation on the set-point signal. The non-linear operation is based on a non-linear functional relationship between the output signal and the parameter.
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Patent Agency Ranking
公开(公告)号：US20180364580A1
公开(公告)日：2018-12-20
申请号：US16061847
申请日：2016-12-15
Applicant: ASML Netherlands B.V.
Inventor： Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Koen Gerhardus Winkels , Theodorus Wilhelmus Driessen , Georgiy O. Vaschenko , Peter Michael Baumgart , Wilhelmus Henricus Theodorus Maria Aangenent , Jan Okke Nieuwenkamp , Wim Ronald Kampinga , Jari Ruotsalainen
CPC classification number: G03F7/70033 , H05G2/006 , H05G2/008
Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.
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公开(公告)号：US20180368242A1
公开(公告)日：2018-12-20
申请号：US15962307
申请日：2018-04-25
Applicant: ASML Netherlands B.V.
Inventor： Koen Gerhardus Winkels , Georgiy O. Vaschenko , Theodorus Wilhelmus Driessen , Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Wilhelmus Henricus Theodorus Maria Aangenent
Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.
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8.发明授权公开(公告)号：US09383659B2
公开(公告)日：2016-07-05
申请号：US14407038
申请日：2013-06-13
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Andre Bernardus Jeunink , Marinus Maria Johannes Van De Wal , Wilhelmus Henricus Theodorus Maria Aangenent , Richard Henricus Adrianus Van Lieshout , Henricus Martinus Johannes Van De Groes , Saartje Willemijn Van Der Hoeven
CPC classification number: G03F7/70775 , G03F7/70783
Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.
Abstract translation: 提供了一种用于将物体定位在光刻设备中的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。
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公开(公告)号：US20140340666A1
公开(公告)日：2014-11-20
申请号：US14357530
申请日：2012-12-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Marie Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
IPC: G03F7/20
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括被配置为将多个辐射束投影到目标上的投影系统; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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公开(公告)号：US10904994B2
公开(公告)日：2021-01-26
申请号：US16671348
申请日：2019-11-01
Applicant: ASML Netherlands B.V.
Inventor： Koen Gerhardus Winkels , Georgiy O. Vaschenko , Theodorus Wilhelmus Driessen , Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Wilhelmus Henricus Theodorus Maria Aangenent
Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.
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