Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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Application No.: US16068211Application Date: 2016-12-07
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Publication No.: US20190011838A1Publication Date: 2019-01-10
- Inventor: Hans BUTLER , Cornelius Adrianus Lambertus DE HOON , Fransiscus Mathijs JACOBS , Pavel KAGAN , Jeroen Pieter STARREVELD , Maurice Willem Jozef Etiënne WIJCKMANS
- Applicant: ASML NETHERLANDS B.V.
- Priority: EP16150424.6 20160107
- International Application: PCT/EP2016/080062 WO 20161207
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.
Information query
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