公开(公告)号：US20210080834A1

公开(公告)日：2021-03-18

申请号：US17050264

申请日：2019-03-18

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Joep Sander DE BEER ,  Cornelius Adrianus Lambertus DE HOON ,  Jeroen Pieter STARREVELD ,  Martinus VAN DUIJNHOVEN ,  Maurice Willem Jozef Etiënn WIJCKMANS

IPC: G03F7/20

Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

公开(公告)号：US20220290734A1

公开(公告)日：2022-09-15

申请号：US17633000

申请日：2020-07-09

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Johan Maarten VAN DE WIJDEVEN ,  Johannes VERMEULEN ,  Jeroen Pieter STARREVELD ,  Stan Henricus VAN DER MEULEN

IPC: F16F15/02 ,  F16F13/00 ,  G03F7/20

Abstract: The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral member that extends between the first and second end portions in a circumferential direction of the support, and a second spiral member that extends between the first and second end portions in a circumferential direction of the support. The first and second spiral members extend in the longitudinal direction around a longitudinal axis of the support, wherein the first spiral member of the coil spring and the second spiral member of the coil spring are moveable relative to each other, and wherein the support further comprises a damper device that is attached to the first spiral member.

公开(公告)号：US20200057379A1

公开(公告)日：2020-02-20

申请号：US16485681

申请日：2018-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Pieter STARREVELD ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

Abstract: The present invention relates to a lithographic apparatus, comprising: a primary frame (10) which is provided with a functional unit (11, 12, 14), a secondary frame (20), a primary frame support (30), which is adapted to support the primary frame onto the secondary frame, a flexible utility connection (40), adapted to connect the functional unit to an auxiliary system (51, 52, 53), a vibration isolation body (60) having a body mass, which is moveably connected to the secondary frame by a flexible passive body support (61) having a body support stiffness, wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.

公开(公告)号：US20210080835A1

公开(公告)日：2021-03-18

申请号：US17053021

申请日：2019-04-23

Applicant: ASML Netherlands B.V.

Inventor： Roy Hendrikus Emilie Maria JACOBS ,  Cornelius Adrianus Lambertus DE HOON ,  Jeroen Pieter STARREVELD ,  Johannes Petrus Martinus Ber VERMEULEN

IPC: G03F7/20 ,  F16F13/00 ,  F16F15/04 ,  F16F15/023

Abstract: The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.

公开(公告)号：US20190011838A1

公开(公告)日：2019-01-10

申请号：US16068211

申请日：2016-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Fransiscus Mathijs JACOBS ,  Pavel KAGAN ,  Jeroen Pieter STARREVELD ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.

公开(公告)号：US20220082947A1

公开(公告)日：2022-03-17

申请号：US17423328

申请日：2019-12-13

Applicant: ASML Netherlands B.V.

Inventor： Marinus Engelbertus Cornelis MUTSAERS ,  Robertus Johannes Marinus DE JONGH ,  Jeroen Pieter STARREVELD

IPC: G03F7/20

Abstract: Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.

公开(公告)号：US20210240090A1

公开(公告)日：2021-08-05

申请号：US17049719

申请日：2019-04-04

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Joep Sander DE BEER ,  Cornelius Adrianus Lambertus DE HOON ,  Jeroen Pieter STARREVELD ,  Martinus VAN DUIJNHOVEN ,  Maurice Willem Jozef Etiënn WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

公开(公告)号：US20160334718A1

公开(公告)日：2016-11-17

申请号：US15109427

申请日：2014-12-18

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  INgmar August KERP ,  Pieter Johannes Gertrudis MEIJERS ,  Jeroen Pieter STARREVELD ,  Derk TEN HOOPEN ,  Martinus VAN DUIJNHOVEN ,  Edward HAGE ,  Evert Hendrik Jan DRAAIJER ,  Wesley OOMS

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  F16F15/0232 ,  G03F7/70733 ,  G03F7/70833 ,  G03F7/709

Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

Abstract translation: 支撑装置，被配置为相对于第二部分支撑第一部分，最小化两个部分之间的振动传递，包括构造成在压力下使用气体以在第一和第二部分之间提供支撑力的支撑系统; 连接到支撑系统并被配置为容纳处于压力下的气体并将气体提供给支撑系统的气体室; 以及一部分声阻尼材料，其布置在所述气体室内的位置处，以分离所述气体室内的第一气体容纳区域和第二气体容纳区域，其中所述声学阻尼材料部分具有第一侧面和第二侧面 其中所述第一气体容纳区域在所述第一侧上且所述第二气体容纳区域位于所述第二侧。