公开(公告)号：US20230279919A1

公开(公告)日：2023-09-07

申请号：US18178088

申请日：2023-03-03

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Alexander Petrus Josephus VAN LANKVELT ,  Michiel VERVOORDELDONK ,  Pavel KAGAN ,  Marc Wilhelmus Maria VAN DER WIJST ,  Galip Tuna TURKBEY ,  Marco HUISKAMP ,  Ulrich SCHOENHOFF

IPC: F16F9/04 ,  F16F15/027

CPC classification number: F16F9/049 ,  F16F15/027 ,  F16F2224/046 ,  F16F2222/126 ,  F16F2230/42

Abstract: A vibration isolator (10; 210) for supporting a payload and isolating the payload from vibrations has a contact member (12) configured for supporting the payload, at least two pressurized gas compartments (24) arranged offset from each other to support the contact member at different locations, which pressurized gas compartments are connected to each other via a tubing system (54). The tubing system contains at least one restriction (66) at which a cross section of the tubing system is reduced by at least 50%.

公开(公告)号：US20190011838A1

公开(公告)日：2019-01-10

申请号：US16068211

申请日：2016-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Fransiscus Mathijs JACOBS ,  Pavel KAGAN ,  Jeroen Pieter STARREVELD ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.