Invention Application
- Patent Title: LASER CRYSTALLIZATION MEASURING APPARATUS AND METHOD
-
Application No.: US16058545Application Date: 2018-08-08
-
Publication No.: US20190064059A1Publication Date: 2019-02-28
- Inventor: Yong Jun Park , Seung-Ho Han , Kyoung Su Kim , Jin Seo , Se Yoon Oh , Dong-Seop Lim , Sung Hoon Yang , Jun-Yeong Choi
- Applicant: Samsung Display Co., Ltd. , K-MAC
- Priority: KR10-2017-0107314 20170824
- Main IPC: G01N21/21
- IPC: G01N21/21 ; H01L21/67 ; H01L21/66

Abstract:
A laser crystallization measuring apparatus including a spectrometer configured to measure actual data of a spectrum of an actual polycrystalline silicon layer crystallized by a laser crystallization device, and a simulation device that is connected to the spectrometer and is configured to determine simulation data of a spectrum of a virtual polycrystalline silicon layer according to a shape of a virtual protrusion formed in the virtual polycrystalline silicon layer, wherein a shape of an actual protrusion formed in the actual polycrystalline silicon layer is determined by using final data determined by selecting simulation data that is approximate to the actual data.
Information query