Invention Application
- Patent Title: TREATMENT SOLUTION SUPPLY APPARATUS AND SUBSTRATE TREATMENT SYSTEM
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Application No.: US16117664Application Date: 2018-08-30
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Publication No.: US20190076763A1Publication Date: 2019-03-14
- Inventor: Katsunori ICHINO , Tsunenaga NAKASHIMA , Hideo FUNAKOSHI , Nobuaki MATSUOKA , Masayuki KAJIWARA
- Applicant: Tokyo Electron Limited
- Priority: JP2017-174298 20170911
- Main IPC: B01D36/00
- IPC: B01D36/00 ; B01D35/26 ; B05C5/00 ; B05C11/10 ; G03F7/20

Abstract:
A treatment solution supply apparatus to supply a treatment solution to a treatment solution discharge unit via a supply path that is provided with a filter configured to remove foreign substances in the treatment solution and a tubephragm pump to send the treatment solution, the supply path has an opening/closing valve on an upstream side of the tubephragm pump and the filter, and a suck-back valve on a downstream side of the tubephragm pump and the filter, and includes a control unit to control at least the tubephragm pump, the opening/closing valve, and the suck-back valve, wherein the control unit performs: a control of stopping sending of the treatment solution from the tubephragm pump; and a control of suspending discharge of the treatment solution from the treatment solution discharge unit by operation of the suck-back valve, and then closing the opening/closing valve to stop the discharge.
Public/Granted literature
- US10807027B2 Treatment solution supply apparatus and substrate treatment system Public/Granted day:2020-10-20
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