- 专利标题: SEMICONDUCTOR DEVICE ASSEMBLY WITH VAPOR CHAMBER
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申请号: US16247352申请日: 2019-01-14
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公开(公告)号: US20190145713A1公开(公告)日: 2019-05-16
- 发明人: Steven K. Groothuis , Jian Li
- 申请人: Micron Technology, Inc.
- 主分类号: F28D15/04
- IPC分类号: F28D15/04 ; H01L23/427 ; H01L23/367 ; F28D15/02
摘要:
Semiconductor device assemblies having stacked semiconductor dies and thermal transfer devices that include vapor chambers are disclosed herein. In one embodiment, a semiconductor device assembly includes a first semiconductor die, a second semiconductor die on a base region of the first die, and a thermal transfer device attached to a peripheral region of the first die and extending over the second die. The thermal transfer device includes a conductive structure having an internal cavity and a working fluid at least partially filling the cavity. The conductive structure further includes first and second fluid conversion regions adjacent the cavity. The first fluid conversion region transfers heat from at least the peripheral region of the first die to a volume of the working fluid to vaporize the volume in the cavity, and the second fluid conversion region condenses the volume of the working fluid in the cavity after it has been vaporized.
公开/授权文献
- US10551129B2 Semiconductor device assembly with vapor chamber 公开/授权日:2020-02-04
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