公开(公告)号：US20230395463A1

公开(公告)日：2023-12-07

申请号：US18454703

申请日：2023-08-23

申请人： Micron Technology, Inc.

发明人： Sameer S. Vadhavkar ,  Xiao Li ,  Steven K. Groothuis ,  Jian Li ,  Jaspreet S. Gandhi ,  James M. Derderian ,  David R. Hembree

IPC分类号： H01L23/44 ,  H01L25/00 ,  H01L21/56 ,  H01L23/00 ,  H01L23/367 ,  H01L25/18 ,  H01L23/04 ,  H01L21/50 ,  H01L25/065 ,  H01L23/373 ,  H01L21/52 ,  H01L21/54 ,  H01L23/053 ,  H01L23/31

CPC分类号： H01L23/44 ,  H01L25/50 ,  H01L21/563 ,  H01L24/83 ,  H01L23/3675 ,  H01L25/18 ,  H01L23/04 ,  H01L21/50 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/32 ,  H01L24/92 ,  H01L25/0657 ,  H01L23/3736 ,  H01L24/73 ,  H01L21/52 ,  H01L21/54 ,  H01L23/053 ,  H01L23/3128 ,  H01L2924/156 ,  H01L2924/1815 ,  H01L2224/1703 ,  H01L2224/32145 ,  H01L2224/73203 ,  H01L2224/73253 ,  H01L2225/06517 ,  H01L2225/06589 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/16235 ,  H01L2924/16251 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2224/17519 ,  H01L2224/2939 ,  H01L24/29 ,  H01L24/33 ,  H01L2224/1134 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/133 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2224/2919 ,  H01L2224/29191 ,  H01L2224/2929 ,  H01L2224/29393 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/33181 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/83101 ,  H01L2224/83102 ,  H01L2224/83424 ,  H01L2224/83447 ,  H01L2224/8388 ,  H01L2224/92125 ,  H01L2924/15311 ,  H01L2224/83104 ,  H01L2224/1329

摘要： Method for packaging a semiconductor die assemblies. In one embodiment, a method is directed to packaging a semiconductor die assembly having a first die and a plurality of second dies arranged in a stack over the first die, wherein the first die has a peripheral region extending laterally outward from the stack of second dies. The method can comprise coupling a thermal transfer structure to the peripheral region of the first die and flowing an underfill material between the second dies. The underfill material is flowed after coupling the thermal transfer structure to the peripheral region of the first die such that the thermal transfer structure limits lateral flow of the underfill material.

公开(公告)号：US11594462B2

公开(公告)日：2023-02-28

申请号：US16936639

申请日：2020-07-23

申请人： Micron Technology, Inc.

发明人： Steven K. Groothuis ,  Jian Li ,  Haojun Zhang ,  Paul A. Silvestri ,  Xiao Li ,  Shijian Luo ,  Luke G. England ,  Brent Keeth ,  Jaspreet S. Gandhi

IPC分类号： H01L23/36 ,  H01L23/367 ,  H01L23/373 ,  H01L23/42 ,  H01L25/065 ,  H01L25/18 ,  H01L25/00

摘要： Stacked semiconductor die assemblies with multiple thermal paths and associated systems and methods are disclosed herein. In one embodiment, a semiconductor die assembly can include a plurality of first semiconductor dies arranged in a stack and a second semiconductor die carrying the first semiconductor dies. The second semiconductor die can include a peripheral portion that extends laterally outward beyond at least one side of the first semiconductor dies. The semiconductor die assembly can further include a thermal transfer feature at the peripheral portion of the second semiconductor die. The first semiconductor dies can define a first thermal path, and the thermal transfer feature can define a second thermal path separate from the first semiconductor dies.

公开(公告)号：US11417681B2

公开(公告)日：2022-08-16

申请号：US17215308

申请日：2021-03-29

申请人： Micron Technology, Inc.

发明人： Yi Hu ,  Merri L. Carlson ,  Anilkumar Chandolu ,  Indra V. Chary ,  David Daycock ,  Harsh Narendrakumar Jain ,  Matthew J. King ,  Jian Li ,  Brett D. Lowe ,  Prakash Rau Mokhna Rau ,  Lifang Xu

IPC分类号： H01L27/11582 ,  H01L27/11556 ,  H01L27/11565 ,  H01L21/28 ,  H01L21/768 ,  H01L27/115 ,  H01L21/311 ,  H01L21/02 ,  H01L27/11526 ,  H01L27/11519 ,  H01L27/11573 ,  H01L21/3213

摘要： A method used in forming a memory array comprising strings of memory cells and operative through-array-vias (TAVs) comprises forming a stack comprising vertically-alternating insulative tiers and conductive tiers. The stack comprises a TAV region and an operative memory-cell-string region. The TAV region comprises spaced operative TAV areas. Operative channel-material strings are formed in the stack in the operative memory-cell-string region and dummy channel-material strings are formed in the stack in the TAV region laterally outside of and not within the operative TAV areas. Operative TAVs are formed in individual of the spaced operative TAV areas in the TAV region. Other methods and structure independent of method are disclosed.

公开(公告)号：US11302634B2

公开(公告)日：2022-04-12

申请号：US16790148

申请日：2020-02-13

申请人： Micron Technology, Inc.

发明人： Lifang Xu ,  Jian Li ,  Graham R. Wolstenholme ,  Paolo Tessariol ,  George Matamis ,  Nancy M. Lomeli

IPC分类号： H01L23/528 ,  H01L23/522 ,  H01L21/768 ,  H01L27/11582 ,  H01L27/11556

摘要： Microelectronic devices include stadium structures within a stack structure and substantially symmetrically distributed between a first pillar structure and a second pillar structure, each of which vertically extends through the stack structure. The stack structure includes a vertically alternating sequence of insulative materials and conductive materials arranged in tiers. Each of the stadium structures includes staircase structures having steps including lateral ends of some of the tiers. The substantially symmetrical distribution of the stadium structures, and fill material adjacent such structures, may substantially balance material stresses to avoid or minimize bending of the adjacent pillars. Related methods and systems are also disclosed.

公开(公告)号：US11177271B2

公开(公告)日：2021-11-16

申请号：US15705179

申请日：2017-09-14

申请人： Micron Technology, Inc.

发明人： Paolo Tessariol ,  Justin B. Dorhout ,  Indra V. Chary ,  Jun Fang ,  Matthew Park ,  Zhiqiang Xie ,  Scott D. Stull ,  Daniel Osterberg ,  Jason Reece ,  Jian Li

IPC分类号： H01L27/11582 ,  H01L21/768 ,  H01L21/311 ,  H01L23/528 ,  H01L27/11556 ,  H01L21/02 ,  H01L29/10 ,  H01L23/522 ,  H01L27/11575 ,  H01L27/11565

摘要： A device comprises an array of elevationally-extending transistors and a circuit structure adjacent and electrically coupled to the elevationally-extending transistors of the array. The circuit structure comprises a stair step structure comprising vertically-alternating tiers comprising conductive steps that are at least partially elevationally separated from one another by insulative material. Operative conductive vias individually extend elevationally through one of the conductive steps at least to a bottom of the vertically-alternating tiers and individually electrically couple to an electronic component below the vertically-alternating tiers. Dummy structures individually extend elevationally through one of the conductive steps at least to the bottom of the vertically-alternating tiers. Methods are also disclosed.

公开(公告)号：US10964475B2

公开(公告)日：2021-03-30

申请号：US16258904

申请日：2019-01-28

申请人： Micron Technology, Inc.

发明人： Devesh Dadhich Shreeram ,  Sevim Korkmaz ,  Jian Li ,  Sanjeev Sapra ,  Dewali Ray

IPC分类号： H01L49/02 ,  H01G4/008 ,  H01G4/08

摘要： Methods, apparatuses, and systems related to forming a capacitor using a sacrificial material are described. An example method includes forming a first silicate material on a substrate. The method further includes forming a first nitride material on the first silicate material. The method further includes forming a second silicate material on the first nitride material. The method further includes forming a second nitride material on the second silicate material. The method further includes forming a sacrificial material on the second nitride material. The method further includes forming a column of capacitor material through the first silicate material, the first nitride material, the second silicate material, the second nitride material, and the sacrificial material. The method further includes removing the sacrificial material to expose a top portion of the capacitor material.

公开(公告)号：US20210043644A1

公开(公告)日：2021-02-11

申请号：US16532019

申请日：2019-08-05

申请人： Micron Technology, Inc.

发明人： Yi Hu ,  Merri L. Carlson ,  Anilkumar Chandolu ,  Indra V. Chary ,  David Daycock ,  Harsh Narendrakumar Jain ,  Matthew J. King ,  Jian Li ,  Brett D. Lowe ,  Prakash Rau Mokhna Rau ,  Lifang Xu

IPC分类号： H01L27/11582 ,  H01L21/311 ,  H01L21/02 ,  H01L27/11526 ,  H01L27/11519 ,  H01L27/11556 ,  H01L27/11565 ,  H01L27/11573 ,  H01L21/3213

摘要： A method used in forming a memory array comprising strings of memory cells and operative through-array-vias (TAVs) comprises forming a stack comprising vertically-alternating insulative tiers and conductive tiers. The stack comprises a TAV region and an operative memory-cell-string region. The TAV region comprises spaced operative TAV areas. Operative channel-material strings are formed in the stack in the operative memory-cell-string region and dummy channel-material strings are formed in the stack in the TAV region laterally outside of and not within the operative TAV areas. Operative TAVs are formed in individual of the spaced operative TAV areas in the TAV region. Other methods and structure independent of method are disclosed.

公开(公告)号：US10741468B2

公开(公告)日：2020-08-11

申请号：US16229257

申请日：2018-12-21

申请人： Micron Technology, Inc.

发明人： Steven K. Groothuis ,  Jian Li ,  Haojun Zhang ,  Paul A. Silvestri ,  Xiao Li ,  Shijian Luo ,  Luke G. England ,  Brent Keeth ,  Jaspreet S. Gandhi

IPC分类号： H01L23/36 ,  H01L23/367 ,  H01L23/42 ,  H01L25/00 ,  H01L25/065 ,  H01L25/18 ,  H01L23/373

摘要： Stacked semiconductor die assemblies with multiple thermal paths and associated systems and methods are disclosed herein. In one embodiment, a semiconductor die assembly can include a plurality of first semiconductor dies arranged in a stack and a second semiconductor die carrying the first semiconductor dies. The second semiconductor die can include a peripheral portion that extends laterally outward beyond at least one side of the first semiconductor dies. The semiconductor die assembly can further include a thermal transfer feature at the peripheral portion of the second semiconductor die. The first semiconductor dies can define a first thermal path, and the thermal transfer feature can define a second thermal path separate from the first semiconductor dies.

公开(公告)号：US10579570B2

公开(公告)日：2020-03-03

申请号：US16215719

申请日：2018-12-11

申请人： Micron Technology, Inc.

发明人： Jian Li

IPC分类号： G06F13/40 ,  G06F13/16 ,  G06F11/10 ,  G06F11/07

摘要： The present disclosure relates generally to semiconductor memory and methods, and more particularly, to apparatuses, and methods for controlling logic die circuitries. One example apparatus comprises a logic die including a first serialization/deserialization (SERDES) component and a second SERDES component coupled to the logic die, and a switch component coupled to the first SERDES component and the second SERDES component configured to activate one of the number of SERDES components.

公开(公告)号：US20190145713A1

公开(公告)日：2019-05-16

申请号：US16247352

申请日：2019-01-14

申请人： Micron Technology, Inc.

发明人： Steven K. Groothuis ,  Jian Li

IPC分类号： F28D15/04 ,  H01L23/427 ,  H01L23/367 ,  F28D15/02

CPC分类号： F28D15/043 ,  F28D15/0233 ,  F28D15/0266 ,  F28D15/046 ,  H01L23/3675 ,  H01L23/427 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/32 ,  H01L24/73 ,  H01L25/0657 ,  H01L25/18 ,  H01L25/50 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/16146 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2224/32145 ,  H01L2224/32245 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06589 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/1436 ,  H01L2924/1437 ,  H01L2924/1438 ,  H01L2924/16235 ,  H01L2924/16251 ,  H01L2924/1632 ,  H01L2924/014 ,  H01L2924/00014

摘要： Semiconductor device assemblies having stacked semiconductor dies and thermal transfer devices that include vapor chambers are disclosed herein. In one embodiment, a semiconductor device assembly includes a first semiconductor die, a second semiconductor die on a base region of the first die, and a thermal transfer device attached to a peripheral region of the first die and extending over the second die. The thermal transfer device includes a conductive structure having an internal cavity and a working fluid at least partially filling the cavity. The conductive structure further includes first and second fluid conversion regions adjacent the cavity. The first fluid conversion region transfers heat from at least the peripheral region of the first die to a volume of the working fluid to vaporize the volume in the cavity, and the second fluid conversion region condenses the volume of the working fluid in the cavity after it has been vaporized.