- 专利标题: EVAPORATION APPARATUS FOR DEPOSITING MATERIAL ON A FLEXIBLE SUBSTRATE AND METHOD THEREFORE
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申请号: US16318812申请日: 2016-08-01
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公开(公告)号: US20190246504A1公开(公告)日: 2019-08-08
- 发明人: Roland TRASSL
- 申请人: Roland TRASSL , Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 国际申请: PCT/EP2016/068327 WO 20160801
- 主分类号: H05K3/14
- IPC分类号: H05K3/14 ; H05K1/11 ; C23C14/00 ; C23C14/02 ; C23C14/56
摘要:
An evaporation apparatus (100) for depositing material on a flexible substrate (160) supported by a processing drum (170) is provided. The evaporation apparatus includes: a first set (110) of evaporation crucibles aligned in a first line (120) along a first direction for generating a cloud (151) of evaporated material to be deposited on the flexible substrate (160); and a gas supply pipe (130) extending in the first direction and being arranged between an evaporation crucible of the first set (110) of evaporation crucibles and the processing drum (170), wherein the gas supply pipe (130) includes a plurality of outlets (133) for providing a gas supply directed into the cloud of evaporated material, and wherein a position of the plurality of outlets is adjustable for changing a position of the gas supply directed into the cloud of evaporated material.
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