发明申请
- 专利标题: TUNABLE RESISTIVE ELEMENT
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申请号: US16585774申请日: 2019-09-27
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公开(公告)号: US20200028079A1公开(公告)日: 2020-01-23
- 发明人: Jean Fompeyrine , Stefan Abel , Veeresh Vidyadhar Deshpande
- 申请人: International Business Machines Corporation
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; G11C13/00
摘要:
A tunable resistive element, comprising a first terminal, a second terminal, a dielectric layer and an intercalation layer. The dielectric layer and the intercalation layer is arranged between the first terminal and the second terminal. The dielectric layer is configured to form conductive filaments of oxygen vacancies on application of an electric field. The intercalation layer is configured to undergo a topotactic transition comprising an oxygen intercalation in combination with a change in the resistivity of the intercalation layer. A related memory device and a related neuromorphic network comprise resistive memory elements as memory cells and synapses respectively and a corresponding design structure.
公开/授权文献
- US10957854B2 Tunable resistive element 公开/授权日:2021-03-23
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