- 专利标题: Gate Contact Structure for a Semiconductor Device
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申请号: US16653482申请日: 2019-10-15
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公开(公告)号: US20200044064A1公开(公告)日: 2020-02-06
- 发明人: Joachim Weyers , Katarzyna Kowalik-Seidl , Andreas Schloegl , Enrique Vecino Vazquez
- 申请人: Infineon Technologies Dresden GmbH & Co. KG
- 优先权: DE102017105548.7 20170315
- 主分类号: H01L29/73
- IPC分类号: H01L29/73 ; H01L29/06 ; H01L27/06 ; H01L29/40 ; H01L29/43 ; H01L29/78 ; H01L29/66 ; H01L29/423 ; H01L29/739
摘要:
A semiconductor device includes a semiconductor body. The semiconductor body has a first surface and a second surface opposite to the first surface. A transistor cell structure is provided in the semiconductor body. A gate contact structure includes a gate line electrically coupled to a gate electrode layer of the transistor cell structure, and a gate pad electrically coupled to the gate line. A gate resistor structure is electrically coupled between the gate pad and the gate electrode layer. An electric resistivity of the gate resistor structure is greater than the electric resistivity of the gate electrode layer.
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