- 专利标题: METHOD AND DEVICE FOR EXPOSURE OF PHOTOSENSITIVE LAYER
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申请号: US16470709申请日: 2016-12-20
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公开(公告)号: US20200089121A1公开(公告)日: 2020-03-19
- 发明人: Bernhard Thallner , Boris Povazay
- 申请人: EV Group E. Thallner GmbH
- 申请人地址: AT St. Florian am Inn
- 专利权人: EV Group E. Thallner GmbH
- 当前专利权人: EV Group E. Thallner GmbH
- 当前专利权人地址: AT St. Florian am Inn
- 国际申请: PCT/EP2016/081880 WO 20161220
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A method and device for exposing a light-sensitive layer, said method comprising: generating at least one light ray by use of at least one light source, illuminating pixels of an exposure pattern by use of at least one micromirror device having a plurality of micromirrors with respective mirror intensity profiles, and overlaying the mirror intensity profiles of adjacent micromirrors to provide a pattern intensity profile of the exposure pattern by summing the mirror intensity profiles of each illuminated pixel of the exposure pattern.
公开/授权文献
- US11460777B2 Method and device for exposure of photosensitive layer 公开/授权日:2022-10-04
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