- 专利标题： Pellicle Attachment Apparatus
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申请号： US16687535申请日： 2019-11-18
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公开(公告)号： US20200096882A1公开(公告)日： 2020-03-26
- 发明人: Frits VAN DER MEULEN , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Jeroen DEKKERS , Paul JANSSEN , Ronald Harm Gunther KRAMER , Matthias KRUIZINGA , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Erik Roelof LOOPSTRA , Gerrit VAN DEN BOSCH , Jérôme François Sylvain Virgile VAN LOO , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE , Angelo Cesar Peter DE KLERK , Jacobus Maria DINGS , Maurice Leonardus Johannes JANSSEN , Roland Jacobus Johannes KERSTENS , Martinus Jozef Maria KESTERS , Michel LOOS , Geert MIDDEL , Silvester Matheus REIJNDERS , Frank Johannes Christiaan THEUERZEIT , Anne Johannes Wilhelmus VAN LIEVENOOGEN
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F1/22 ; G03F1/64
摘要：
Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
公开/授权文献
- US11003098B2 Pellicle attachment apparatus 公开/授权日：2021-05-11
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