公开(公告)号：US20180329314A1

公开(公告)日：2018-11-15

申请号：US15526654

申请日：2015-11-16

申请人： ASML NETHERLANDS B.V.

发明人： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE

IPC分类号： G03F7/20 ,  G03F1/64 ,  G03F1/22

CPC分类号： G03F7/70983 ,  G03F1/22 ,  G03F1/64 ,  G03F7/70825

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20230023631A1

公开(公告)日：2023-01-26

申请号：US17787235

申请日：2020-11-13

申请人： ASML Netherlands B.V.

发明人： Sander KERSSEMAKERS ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Henricus Gerardus TEGENBOSCH

IPC分类号： G03F7/20 ,  H05G2/00

摘要： A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.

公开(公告)号：US20160077443A1

公开(公告)日：2016-03-17

申请号：US14947628

申请日：2015-11-20

申请人： ASML Holding N.V. ,  ASML Netherlands B.V.

发明人： Robert Gabriël Maria LANSBERGEN ,  George Hilary HARROLD ,  Richard John JOHNSON ,  Hugo Jacobus Gerardus VAN DER WEIJDEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70741 ,  G03F7/70983 ,  H01L21/682

摘要： Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

摘要翻译： 提供了一种用于在具有最少的颗粒产生和除气的真空平版印刷系统内移动和交换标线片的方法和装置。 在该方法的示例中，旋转交换装置（RED）的第一臂接收保持第一掩模版的第一基板。 RED的第二臂支撑并缓冲第二个基板。 第一和第二基板位于与RED的旋转轴线基本上等距的位置。

公开(公告)号：US20200057394A1

公开(公告)日：2020-02-20

申请号：US16587483

申请日：2019-09-30

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François SylvainVirgile VAN LOO ,  Beatrijs Louis Marie-Joseph Katrien VERBRUGGE

IPC分类号： G03F7/20 ,  G03F1/64 ,  G03F1/22

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20190066859A1

公开(公告)日：2019-02-28

申请号：US15770688

申请日：2016-11-03

申请人： ASML Netherlands B.V.

发明人： Pieter Willem Herman DE JAGER ,  Sipke Jacob BIJLSMA ,  Olav Waldemar Vladimir FRIJNS ,  Andrey Alexandrovich NIKIPELOV ,  Nicolaas TEN KATE ,  Antonius Theodorus Anna Maria DERKSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Robert Gabriël Maria LANSBERGEN ,  Aukje KASTELIJN

IPC分类号： G21G1/10 ,  G21G1/12

摘要： A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).

公开(公告)号：US20210375498A1

公开(公告)日：2021-12-02

申请号：US17395709

申请日：2021-08-06

申请人： ASML Netherlands B.V.

发明人： Pieter Willem Herman DE JAGER ,  Sipke Jacob BIJLSMA ,  Olav Waldemar Vladimir FRIJNS ,  Andrey Alexandrovich NIKIPELOV ,  Nicolaas TEN KATE ,  Antonius Theodorus Anna Maria DERKSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Robert Gabriël Maria LANSBERGEN ,  Aukje Arianne Annette KASTELIJN

IPC分类号： G21G1/10 ,  G21G1/12

摘要： A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.

公开(公告)号：US20200096882A1

公开(公告)日：2020-03-26

申请号：US16687535

申请日：2019-11-18

申请人： ASML Netherlands B.V.

发明人： Frits VAN DER MEULEN ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Ronald Harm Gunther KRAMER ,  Matthias KRUIZINGA ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Erik Roelof LOOPSTRA ,  Gerrit VAN DEN BOSCH ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE ,  Angelo Cesar Peter DE KLERK ,  Jacobus Maria DINGS ,  Maurice Leonardus Johannes JANSSEN ,  Roland Jacobus Johannes KERSTENS ,  Martinus Jozef Maria KESTERS ,  Michel LOOS ,  Geert MIDDEL ,  Silvester Matheus REIJNDERS ,  Frank Johannes Christiaan THEUERZEIT ,  Anne Johannes Wilhelmus VAN LIEVENOOGEN

IPC分类号： G03F7/20 ,  G03F1/22 ,  G03F1/64

摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.