公开(公告)号：US20200096882A1

公开(公告)日：2020-03-26

申请号：US16687535

申请日：2019-11-18

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Ronald Harm Gunther KRAMER ,  Matthias KRUIZINGA ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Erik Roelof LOOPSTRA ,  Gerrit VAN DEN BOSCH ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE ,  Angelo Cesar Peter DE KLERK ,  Jacobus Maria DINGS ,  Maurice Leonardus Johannes JANSSEN ,  Roland Jacobus Johannes KERSTENS ,  Martinus Jozef Maria KESTERS ,  Michel LOOS ,  Geert MIDDEL ,  Silvester Matheus REIJNDERS ,  Frank Johannes Christiaan THEUERZEIT ,  Anne Johannes Wilhelmus VAN LIEVENOOGEN

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.