- 专利标题: ULTRAVIOLET LIGHT-RESISTANT ARTICLES AND METHODS FOR MAKING THE SAME
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申请号: US16715472申请日: 2019-12-16
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公开(公告)号: US20200170134A1公开(公告)日: 2020-05-28
- 发明人: Kaveh Adib , Robert Alan Bellman , Andrea Weiss Bookbinder , Shandon Dee Hart , Albert Peter Heberle , Karl William Koch, III , Lin Lin , Charles Andrew Paulson , Vitor Marino Schneider
- 申请人: CORNING INCORPORATED
- 主分类号: H05K5/03
- IPC分类号: H05K5/03 ; H04B1/3888 ; H04M1/02 ; H05K5/00 ; C23C14/34 ; C23C14/00 ; C23C14/02 ; C23C14/58 ; H01J37/32 ; C23C14/28 ; C23C16/56 ; C23C16/02 ; C23C16/50 ; C03C17/34
摘要:
An ultraviolet light-resistant article that includes: a substrate having a glass or glass-ceramic composition and first and second primary surfaces; an ultraviolet light-absorbing element having a an absorptivity greater than 50% at wavelengths from about 100 nm to about 380 nm and a thickness between about 10 nm and about 100 nm; and a dielectric stack formed with a plasma-enhanced process. Further, the light-absorbing element is between the substrate and the dielectric stack. Alternatively, the light-absorbing element can include one or more ultraviolet light-resistant layers disposed within the dielectric stack over the first primary surface.
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