发明申请
- 专利标题: BARRIER FILMS AND QUANTUM DOT POLYMER COMPOSITE ARTICLES INCLUDING THE SAME
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申请号: US16812447申请日: 2020-03-09
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公开(公告)号: US20200208011A1公开(公告)日: 2020-07-02
- 发明人: Tomoyuki KIKUCHI , EunJoo JANG , Hyun A KANG , Nayoun WON , Oul CHO
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4c830690
- 主分类号: C09D181/00
- IPC分类号: C09D181/00 ; C09K11/62 ; C09K11/02 ; B32B27/00 ; B32B1/08 ; B32B15/082 ; B32B27/08 ; B32B27/30 ; B32B27/34 ; B32B27/20 ; B32B27/36 ; B32B17/00 ; B32B27/28 ; B32B15/20 ; B32B27/32 ; B32B15/092 ; B32B15/095 ; B32B27/18 ; B32B7/04 ; B32B27/38 ; C09D183/16
摘要:
A barrier film comprising: a substrate; a first layer disposed on the substrate and comprising an oxidation product of polysilazane; and a second layer disposed directly on the first layer and comprising a thiol-ene polymer, wherein the polysilazane comprises a repeating unit represented by Chemical Formula 1, wherein R1 and R2 are each independently hydrogen, an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an alkylsilyl group, an alkylamino group, an alkoxy group, or an aromatic hydrocarbon group, and wherein the thiol-ene polymer is a polymerization product of a monomer combination including a first monomer having at least two thiol groups at its terminal end and a second monomer having at least two carbon-carbon unsaturated bond-containing groups at its terminal end.
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