Invention Application
- Patent Title: ANTIREFLECTION FILM, OPTICAL ELEMENT, AND OPTICAL SYSTEM
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Application No.: US16813703Application Date: 2020-03-09
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Publication No.: US20200209436A1Publication Date: 2020-07-02
- Inventor: Seigo NAKAMURA , Tatsuya YOSHIHIRO , Kenichi UMEDA , Yuichiro ITAI
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@eff1ad6
- Main IPC: G02B1/115
- IPC: G02B1/115 ; G02B1/04 ; C03C17/36 ; C03C17/34

Abstract:
An antireflection film is provided on a substrate and includes an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, which are laminated in this order on a side of a substrate, in which the interlayer is a multilayer film having at least two layers in which a layer of high refractive index having a relatively high refractive index and a layer of lower refractive index having a relatively low refractive index are alternately laminated, the dielectric layer has a surface exposed to air, and the dielectric layer is a multilayer film including a silicon-containing oxide layer, a magnesium fluoride layer, and an adhesion layer provided between the silicon-containing oxide layer and the magnesium fluoride layer and configured to increase adhesiveness between the silicon-containing oxide layer and the magnesium fluoride layer.
Public/Granted literature
- US11422290B2 Antireflection film, optical element, and optical system Public/Granted day:2022-08-23
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