- 专利标题: CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PLURALITY OF CHARGED PARTICLE BEAMLETS
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申请号: US16778468申请日: 2020-01-31
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公开(公告)号: US20200273667A1公开(公告)日: 2020-08-27
- 发明人: Ali Mohammadi-Gheidari , Erik René Kieft , Pieter Kruit
- 申请人: FEI Company
- 申请人地址: US OR Hillsboro
- 专利权人: FEI Company
- 当前专利权人: FEI Company
- 当前专利权人地址: US OR Hillsboro
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7b1ae88d
- 主分类号: H01J37/317
- IPC分类号: H01J37/317 ; H01J37/12 ; H01J37/244
摘要:
The invention relates to a charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets. The charged particle beam device comprises a specimen holder for holding a specimen; a source for producing a beam of charged particles; and an illuminator for converting said beam of charged particles into a plurality of charged particle beamlets and directing said plurality of charged particle beamlets onto said specimen. According to the disclosure, the illuminator comprises a multi-aperture lens plate having a plurality of apertures for defining the corresponding plurality of charged particle beamlets; as well as at least a first electrode for generating an electrical field at a surface of the multi-aperture lens plate. The apertures in said multi-aperture lens plate have a noncircular cross-sectional shape to correct for neighbouring aperture induced aberrations. This allows for decreased spot size, and with this imaging resolution of the device is increased.
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