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    Studying dynamic specimen behavior in a charged-particle microscope
    2.
    发明授权
    Studying dynamic specimen behavior in a charged-particle microscope 有权

    公开(公告)号：US10340113B2

    公开(公告)日：2019-07-02

    申请号：US15389151

    申请日：2016-12-22

    申请人： FEI Company

    发明人： Erik René Kieft ,  Walter van Dijk

    IPC分类号： H01J37/04 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20

    摘要： A method of using a Charged Particle Microscope, comprising: A specimen holder, for holding a specimen; A source, for producing an irradiating beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; A detector, for detecting a flux of emergent radiation emanating from the specimen in response to said irradiation, additionally comprising the following steps: In said illuminator, providing an aperture plate comprising an array of apertures; Using a deflecting device to scan said beam across said array, thereby alternatingly interrupting and transmitting the beam so as to produce a train of beam pulses; Irradiating said specimen with said train of pulses, and using said detector to perform positionally resolved (temporally discriminated) detection of the attendant emergent radiation.

    Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets
    3.
    发明授权
    Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets 有权

    公开(公告)号：US11961709B2

    公开(公告)日：2024-04-16

    申请号：US17873778

    申请日：2022-07-26

    申请人： FEI Company

    发明人： Ali Mohammadi-Gheidari ,  Erik René Kieft ,  Pieter Kruit

    IPC分类号： H01J37/317 ,  H01J37/12 ,  H01J37/244

    CPC分类号： H01J37/3177 ,  H01J37/12 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/2817

    摘要： The invention relates to a charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets. The charged particle beam device comprises a specimen holder for holding a specimen; a source for producing a beam of charged particles; and an illuminator for converting said beam of charged particles into a plurality of charged particle beamlets and directing said plurality of charged particle beamlets onto said specimen. According to the disclosure, the illuminator comprises a multi-aperture lens plate having a plurality of apertures for defining the corresponding plurality of charged particle beamlets; as well as at least a first electrode for generating an electrical field at a surface of the multi-aperture lens plate. The apertures in said multi-aperture lens plate have a noncircular cross-sectional shape to correct for neighbouring aperture induced aberrations. This allows for decreased spot size, and with this imaging resolution of the device is increased.

    TIME-RESOLVED CHARGED PARTICLE MICROSCOPY
    6.
    发明申请
    TIME-RESOLVED CHARGED PARTICLE MICROSCOPY 审中-公开

    公开(公告)号：US20180151326A1

    公开(公告)日：2018-05-31

    申请号：US15364163

    申请日：2016-11-29

    申请人： FEI Company

    发明人： Erik René Kieft

    IPC分类号： H01J37/04 ,  H01J37/244 ,  H01J37/147 ,  H01J37/22

    CPC分类号： H01J37/045 ,  H01J37/147 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/152 ,  H01J2237/2802

    摘要： A method of investigating a specimen using charged particle microscopy, comprising the following steps: Using a primary source to produce a pulsed beam of charged particles that propagate along a beam path; Providing a specimen at an irradiation position in said beam path; Using a secondary source to produce repetitive excitations of the specimen; Using a detector to register charged particles in said beam that traverse the specimen after each said excitation, wherein: Said primary source is configured to produce a train of multiple pulses per excitation by said secondary source; Said detector is configured to comprise an integrated array of pixels, each with an individual readout circuit, to register a time-of-arrival of individual particles in said train.

    BEAM PULSING DEVICE FOR USE IN CHARGED-PARTICLE MICROSCOPY
    7.
    发明申请
    BEAM PULSING DEVICE FOR USE IN CHARGED-PARTICLE MICROSCOPY 审中-公开
    用于充电颗粒显微镜的波束脉冲装置

    公开(公告)号：US20140103225A1

    公开(公告)日：2014-04-17

    申请号：US14056710

    申请日：2013-10-17

    申请人： FEI Company

    发明人： Erik René Kieft ,  Fredericus Bernardus Kiewiet ,  Adam Christopher Lassise ,  Otger Jan Luiten ,  Petrus Henricus Antonius Mutsaers ,  Edgar Jan Dirk Vredenbregt ,  Alexander Henstra

    IPC分类号： H01J37/04

    CPC分类号： H01J37/045 ,  H01J37/28 ,  H01J2237/0432

    摘要： The invention relates to a charged-particle microscope comprising a charged-particle source; a sample holder; a charged-particle lens system; a detector; and a beam pulsing device, for causing the beam to repeatedly switch on and off so as to produce a pulsed beam. The beam pulsing device comprises a unitary resonant cavity disposed about a particle-optical axis and has an entrance aperture and an exit aperture for the beam. The resonant cavity is configured to simultaneously produce a first oscillatory deflection of the beam at a first frequency in a first direction and a second oscillatory deflection of the beam at a second, different frequency in a second, different direction. The resonant cavity may have an elongated (e.g. rectangular or elliptical) cross-section, with a long axis parallel to said first direction and a short axis parallel to said second direction.

    摘要翻译： 本发明涉及包含带电粒子源的带电粒子显微镜; 样品架 带电粒子透镜系统; 检测器 以及光束脉冲装置，用于使光束重复打开和关闭以产生脉冲光束。 束脉冲装置包括围绕粒子 - 光轴设置的整体谐振腔，并具有用于束的入射孔和出射孔。 谐振腔被配置成同时在第一方向上以第一频率和第二不同频率处的第二不同方向上产生第一振荡偏转波束的第二振荡偏转。 谐振腔可以具有细长（例如矩形或椭圆形）横截面，其中长轴平行于所述第一方向和短轴平行于所述第二方向。

    CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PLURALITY OF CHARGED PARTICLE BEAMLETS
    8.
    发明公开
    CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PLURALITY OF CHARGED PARTICLE BEAMLETS 审中-公开

    公开(公告)号：US20240006149A1

    公开(公告)日：2024-01-04

    申请号：US17873778

    申请日：2022-07-26

    申请人： FEI Company

    发明人： Ali Mohammadi-Gheidari ,  Erik René Kieft ,  Pieter Kruit

    IPC分类号： H01J37/317 ,  H01J37/12 ,  H01J37/244

    CPC分类号： H01J37/3177 ,  H01J37/12 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/2817

    摘要： The invention relates to a charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets. The charged particle beam device comprises a specimen holder for holding a specimen; a source for producing a beam of charged particles; and an illuminator for converting said beam of charged particles into a plurality of charged particle beamlets and directing said plurality of charged particle beamlets onto said specimen. According to the disclosure, the illuminator comprises a multi-aperture lens plate having a plurality of apertures for defining the corresponding plurality of charged particle beamlets; as well as at least a first electrode for generating an electrical field at a surface of the multi-aperture lens plate. The apertures in said multi-aperture lens plate have a noncircular cross-sectional shape to correct for neighbouring aperture induced aberrations. This allows for decreased spot size, and with this imaging resolution of the device is increased.

    CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PLURALITY OF CHARGED PARTICLE BEAMLETS
    9.
    发明申请
    CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PLURALITY OF CHARGED PARTICLE BEAMLETS 审中-公开

    公开(公告)号：US20200273667A1

    公开(公告)日：2020-08-27

    申请号：US16778468

    申请日：2020-01-31

    申请人： FEI Company

    发明人： Ali Mohammadi-Gheidari ,  Erik René Kieft ,  Pieter Kruit

    IPC分类号： H01J37/317 ,  H01J37/12 ,  H01J37/244

    摘要： The invention relates to a charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets. The charged particle beam device comprises a specimen holder for holding a specimen; a source for producing a beam of charged particles; and an illuminator for converting said beam of charged particles into a plurality of charged particle beamlets and directing said plurality of charged particle beamlets onto said specimen. According to the disclosure, the illuminator comprises a multi-aperture lens plate having a plurality of apertures for defining the corresponding plurality of charged particle beamlets; as well as at least a first electrode for generating an electrical field at a surface of the multi-aperture lens plate. The apertures in said multi-aperture lens plate have a noncircular cross-sectional shape to correct for neighbouring aperture induced aberrations. This allows for decreased spot size, and with this imaging resolution of the device is increased.

    Time-resolved charged particle microscopy
    10.
    发明授权
    Time-resolved charged particle microscopy 有权

    公开(公告)号：US10032599B2

    公开(公告)日：2018-07-24

    申请号：US15364163

    申请日：2016-11-29

    申请人： FEI Company

    发明人： Erik René Kieft

    IPC分类号： H01J37/28 ,  H01J37/26 ,  H01J37/04 ,  H01J37/244 ,  H01J37/147 ,  H01J37/22

    摘要： A method of investigating a specimen using charged particle microscopy, comprising the following steps: Using a primary source to produce a pulsed beam of charged particles that propagate along a beam path; Providing a specimen at an irradiation position in said beam path; Using a secondary source to produce repetitive excitations of the specimen; Using a detector to register charged particles in said beam that traverse the specimen after each said excitation, wherein: Said primary source is configured to produce a train of multiple pulses per excitation by said secondary source; Said detector is configured to comprise an integrated array of pixels, each with an individual readout circuit, to register a time-of-arrival of individual particles in said train.