Invention Application
- Patent Title: FABRICATION SYSTEM OF SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME
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Application No.: US16676588Application Date: 2019-11-07
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Publication No.: US20200348599A1Publication Date: 2020-11-05
- Inventor: Keunhee Bai , Jinhong Park , Jinseok Heo , Seungmin Lee , Suntaek Lim
- Applicant: Samsung Electronics Co., Ltd.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@288def07
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/268

Abstract:
Disclosed are a system for fabricating a semiconductor device and a method of fabricating a semiconductor device. The system may include a chamber, an extreme ultraviolet (EUV) source in the chamber and configured to generate an EUV beam, an optical system on the EUV source and configured to provide the EUV beam to a substrate, a substrate stage in the chamber and configured to receive the substrate, a reticle stage in the chamber and configured to hold a reticle that is configured to project the EUV beam onto the substrate, and a particle collector between the reticle and the optical system and configured to allow for a selective transmission of the EUV beam and to remove a particle.
Public/Granted literature
- US11086224B2 Fabrication system of semiconductor device and method of fabricating a semiconductor device using the same Public/Granted day:2021-08-10
Information query
IPC分类: