- 专利标题: SUBSTRATE PROCESSING SYSTEM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
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申请号: US16918626申请日: 2020-07-01
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公开(公告)号: US20210003990A1公开(公告)日: 2021-01-07
- 发明人: Yasuhiro MIZUGUCHI , Shun MATSUI , Tadashi TAKASAKI , Naofumi OHASHI
- 申请人: KOKUSAI ELECTRIC CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: KOKUSAI ELECTRIC CORPORATION
- 当前专利权人: KOKUSAI ELECTRIC CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2019-125202 20190704
- 主分类号: G05B19/406
- IPC分类号: G05B19/406 ; H01L21/67
摘要:
There is provided a technique that includes a plurality of substrate processing apparatuses each configured to process a substrate; a first controller installed in each substrate processing apparatus among the plurality of substrate processing apparatuses and configured to control the substrate processing apparatus; a relay configured to receive a plurality of types of data from the first controller; and a second controller configured to receive the data from the relay, wherein the relay is configured to change a transmission interval of the data to the second controller according to one of each type of the data and each first controller, or according to both of each type of the data and each first controller.
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