• Patent Title: LOW WATER-SENSITIVE DENTAL COMPOSITION
  • Application No.: US16829259
    Application Date: 2020-03-25
  • Publication No.: US20210007938A1
    Publication Date: 2021-01-14
  • Inventor: Yusei KADOBAYASHIHiroshi YAANAJun UCHIDAYuji SADAKANE
  • Applicant: SHOFU INC.
  • Applicant Address: JP Kyoto
  • Assignee: SHOFU INC.
  • Current Assignee: SHOFU INC.
  • Current Assignee Address: JP Kyoto
  • Priority: JP2019-057535 20190326,JP2019-057536 20190326,JP2019-057537 20190326,JP2019-057538 20190326,JP2019-057555 20190326,JP2019-057556 20190326,JP2019-150038 20190819,JP2019-175309 20190926,JP2019-175327 20190926,JP2019-175336 20190926,JP2019-175354 20190926,JP2019-232733 20191224
  • Main IPC: A61K6/887
  • IPC: A61K6/887 A61K6/62 A61K6/30 A61K6/40 A61K6/77
LOW WATER-SENSITIVE DENTAL COMPOSITION
Abstract:
An object of the present disclosure is to provide a dental composition that can exhibit sufficient curability even in a state where moisture is excessive as in the oral environment. The dental composition of the present disclosure contains component (a): monomer containing (meth)acrylamide group represented by formula (1): (In formula, R represents a hydrogen atom or a methyl group and Rs may be the same or different from each other. R2 is an alkyl group having 2 to 6 carbon atoms and R2s may be the same or different from each other.)
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