- 专利标题: NONVOLATILE MEMORY APPARATUS INCLUDING RESISTIVE-CHANGE MATERIAL LAYER
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申请号: US17060884申请日: 2020-10-01
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公开(公告)号: US20210020835A1公开(公告)日: 2021-01-21
- 发明人: Minhyun LEE , Seongjun PARK , Hyunjae SONG , Hyeonjin SHIN , Kibum KIM , Sanghun LEE , Yunho KANG
- 申请人: Samsung Electronics Co., Ltd. , SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- 申请人地址: KR Suwon-si; KR Seoul
- 专利权人: Samsung Electronics Co., Ltd.,SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- 当前专利权人: Samsung Electronics Co., Ltd.,SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- 当前专利权人地址: KR Suwon-si; KR Seoul
- 优先权: KR10-2017-0138453 20171024
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; H01L21/768 ; G11C13/00
摘要:
A nonvolatile memory apparatus includes a first electrode, a second electrode separated from the first electrode, a resistive-change material layer provided between the first electrode and the second electrode and configured to store information due to a resistance change caused by an electrical signal applied through the first electrode and the second electrode, and a diffusion prevention layer provided between the first electrode and the resistive-change material layer and/or between the second electrode and the resistive-change material layer and including a two-dimensional (2D) material having a monolayer thickness of about 0.35 nm or less.
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