- 专利标题: Backplane, Preparation Method Thereof, Backlight Module and Display Device
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申请号: US16920401申请日: 2020-07-02
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公开(公告)号: US20210036196A1公开(公告)日: 2021-02-04
- 发明人: Zhiwei LIANG , Wenqian LUO , Yingwei LIU , Ke WANG , Shengguang BAN , Zhanfeng CAO
- 申请人: BOE Technology Group Co., Ltd.
- 申请人地址: CN Beijing
- 专利权人: BOE Technology Group Co., Ltd.
- 当前专利权人: BOE Technology Group Co., Ltd.
- 当前专利权人地址: CN Beijing
- 优先权: CN201910708843.X 20190801
- 主分类号: H01L33/62
- IPC分类号: H01L33/62 ; H01L23/00
摘要:
A preparation method of a backplane includes: forming an insulating structure layer having a groove on a base substrate by a mask exposure process, the groove being used for accommodating a metal trace; and repeating a metal sub-layer forming step including an ashing process and a wet etching process multiple times to form the metal trace positioned in the groove.
公开/授权文献
- US11742467B2 Backplane, preparation method with dual damascene steps 公开/授权日:2023-08-29
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