Invention Application
- Patent Title: PATTERNING METHOD FOR PREPARING TOP-GATE, BOTTOM-CONTACT ORGANIC FIELD EFFECT TRANSISTORS
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Application No.: US16978659Application Date: 2019-02-27
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Publication No.: US20210036248A1Publication Date: 2021-02-04
- Inventor: Wei Hsiang LIN , Mi ZHOU , JunMin LEE , Giseok LEE , Stefan BECKER
- Applicant: Clap Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: Clap Co., Ltd.
- Current Assignee: Clap Co., Ltd.
- Current Assignee Address: KR Seoul
- Priority: EP18160518.9 20180307
- International Application: PCT/EP2019/054778 WO 20190227
- Main IPC: H01L51/05
- IPC: H01L51/05 ; H01L51/00

Abstract:
The present invention relates to a process for the preparation of a top-gate, bottom-contact organic field effect transistor on a substrate, which organic field effect transistor comprises source and drain electrodes, a semiconducting layer, a cured first dielectric layer and a gate electrode, and which process comprises the steps of: i) applying a composition comprising an organic semiconducting material to form the semiconducting layer, ii) applying a composition comprising a first dielectric material and a crosslinking agent carrying at least two azide groups to form a first dielectric layer, iii) curing portions of the first dielectric layer by light treatment, iv) removing the uncured portions of the first dielectric layer, and v) removing the portions of the semiconducting layer that are not covered by the cured first dielectric layer, wherein the first dielectric material comprises a star-shaped polymer consisting of at least one polymer block A and at least two polymer blocks B, wherein each polymer block B is attached to the polymer block A, and wherein at least 60 mol % of
the repeat units of polymer block B are selected from the group consisting of Formulas (1A), (1B), (1C), (1D), (1E) and (1F), wherein R1, R2, R3, R4, R5, R6, R7 and R8 are independently and at each occurrence H or C1-C10-alkyl.
the repeat units of polymer block B are selected from the group consisting of Formulas (1A), (1B), (1C), (1D), (1E) and (1F), wherein R1, R2, R3, R4, R5, R6, R7 and R8 are independently and at each occurrence H or C1-C10-alkyl.
Public/Granted literature
- US11296290B2 Patterning method for preparing top-gate, bottom-contact organic field effect transistors Public/Granted day:2022-04-05
Information query
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