- 专利标题: Common Electrostatic Chuck For Differing Substrates
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申请号: US17012275申请日: 2020-09-04
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公开(公告)号: US20210074523A1公开(公告)日: 2021-03-11
- 发明人: Vinodh Ramachandran , Ananthkrishna Jupudi , Sarath Babu
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01J37/32
- IPC分类号: H01J37/32 ; H01L21/683
摘要:
An apparatus, methods and controllers for electrostatically chucking varied substrate materials are disclosed. Some embodiments of the disclosure provide electrostatic chucks with variable polarity and/or voltage. Some embodiments of the disclosure provide electrostatic chucks able to operate as monopolar and bipolar electrostatic chucks. Some embodiments of the disclosure provide bipolar electrostatic chucks able to compensate for substrate bias and produce approximately equal chucking force at different electrodes.
公开/授权文献
- US11476097B2 Common electrostatic chuck for differing substrates 公开/授权日:2022-10-18
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