- 专利标题: NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM
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申请号: US16613472申请日: 2018-05-16
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公开(公告)号: US20210080829A1公开(公告)日: 2021-03-18
- 发明人: Yusuke Fukuzaki , Hirokazu Iimori , Yoshihiko Inoue
- 申请人: Toray Industries, Inc.
- 申请人地址: JP Tokyo
- 专利权人: Toray Industries, Inc.
- 当前专利权人: Toray Industries, Inc.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2017-102293 20170524,JP2017-102294 20170524
- 国际申请: PCT/JP2018/018947 WO 20180516
- 主分类号: G03F7/075
- IPC分类号: G03F7/075 ; C08G77/14 ; C08G65/18 ; C03C17/30
摘要:
A negative photosensitive resin composition is provided which contains (A) a siloxane resin having a radically polymerizable group and a carboxyl group and/or a dicarboxylic acid anhydride group, (B) a reactive monomer, (C) a radical photopolymerization initiator, (D) silica particles and (E) a siloxane compound having an oxetanyl group. The present invention provides a negative photosensitive resin composition which is capable of forming a cured film that has high glass surface strength, while exhibiting excellent adhesion to an inorganic film or to an organic film.
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