- 专利标题： PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
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申请号： US16977360申请日： 2019-02-28
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公开(公告)号： US20210109452A1公开(公告)日： 2021-04-15
- 发明人: Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/EP2019/054924 WO 20190228
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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