Invention Application
- Patent Title: CHIP PRODUCTION METHOD, AND, SILICON CHIP
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Application No.: US16605878Application Date: 2018-02-09
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Publication No.: US20210125868A1Publication Date: 2021-04-29
- Inventor: Tomoya TAGUCHI , Takeshi SAKAMOTO
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Priority: JP2017-082256 20170418
- International Application: PCT/JP2018/004716 WO 20180209
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L23/00 ; H01L21/308 ; H01L21/3065 ; H01L21/268

Abstract:
A chip production method includes a first step of setting a first cutting line and a second cutting line on a substrate including a plurality of functional elements, a second step of forming a mask on the substrate such that the functional elements are covered and an intersection region including an intersection of the first cutting line and the second cutting line is exposed, a third step of removing the intersection region from the substrate and forming a penetration hole by etching the substrate using the mask, a fourth step of forming a modified region in the substrate along the first cutting line, a fifth step of forming a modified region in the substrate along the second cutting line, and a sixth step of forming chips by cutting the substrate along the first cutting line and the second cutting line.
Public/Granted literature
- US11367655B2 Forming openings at intersection of cutting lines Public/Granted day:2022-06-21
Information query
IPC分类: