- 专利标题: TRANSISTOR WITH INSULATOR
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申请号: US16812292申请日: 2020-03-07
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公开(公告)号: US20210280684A1公开(公告)日: 2021-09-09
- 发明人: Ye LU , Haining YANG , Junjing BAO
- 申请人: QUALCOMM Incorporated
- 申请人地址: US CA San Diego
- 专利权人: QUALCOMM Incorporated
- 当前专利权人: QUALCOMM Incorporated
- 当前专利权人地址: US CA San Diego
- 主分类号: H01L29/423
- IPC分类号: H01L29/423 ; H01L29/786 ; H01L29/51 ; H01L29/66
摘要:
A gate all around transistor may be improved to provide better transistor circuits performance. In one example, a transistor circuit may include a dielectric or air gap as an insulator between the channels of the transistors in the circuit. In another example, a transistor may include a first channel surrounded by a first metal, a second channel surrounded by a second metal proximate to the first channel, and an insulator, such as a dielectric or air gap, between the first metal and the second metal. The insulator helps reduce the parasitic capacitance between the source/drain regions and the metal fill regions of the transistor.
公开/授权文献
- US11164952B2 Transistor with insulator 公开/授权日:2021-11-02
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