- 专利标题： NOZZLE FOR CLEANING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
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申请号： US16614311申请日： 2019-06-20
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公开(公告)号： US20210331184A1公开(公告)日： 2021-10-28
- 发明人: Beom Jin KIM , Hyun Sin KIM
- 申请人： HS HI-TECH CO., LTD.
- 申请人地址： KR Hwaseong, Gyeonggi-do
- 专利权人： HS HI-TECH CO., LTD.
- 当前专利权人： HS HI-TECH CO., LTD.
- 当前专利权人地址： KR Hwaseong, Gyeonggi-do
- 优先权： KR10-2018-0072752 20180625
- 国际申请： PCT/KR2019/007431 WO 20190620
- 主分类号： B05B1/18
- IPC分类号： B05B1/18 ; B08B3/02 ; H01L21/67
摘要：
The present invention relates to a nozzle for cleaning a substrate by discharging cleaning liquid to the substrate and a method of manufacturing the nozzle and, more particularly, to a nozzle for cleaning a substrate and a method of manufacturing the nozzle, the nozzle having pressure resistance performance capable of enduring high supply pressure of the cleaning liquid.
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