Invention Application
- Patent Title: COMPOSITION, FILM, AND FILM FORMING METHOD
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Application No.: US17477815Application Date: 2021-09-17
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Publication No.: US20220002567A1Publication Date: 2022-01-06
- Inventor: Masahiro MORI , Shoichi NAKAMURA
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Main IPC: C09D7/40
- IPC: C09D7/40 ; C09D183/04 ; C09D4/06 ; C09D133/06 ; C09D7/45 ; C09D7/65 ; C09D7/61 ; G02B1/111 ; B05D1/00
Abstract:
Provided are a composition, a film, and a film forming method. The composition includes: silica particles; a silicone-based surfactant; and a solvent, in which a content of the silicone-based surfactant in the composition is 0.01 to 0.30 mass % or a content of the silicone-based surfactant is 0.05 to 5.00 mass % with respect to a total solid content of the composition.
Information query
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