Invention Application
- Patent Title: DIELECTRIC SUBSTRATE AND METHOD OF FORMING THE SAME
-
Application No.: US17443390Application Date: 2021-07-26
-
Publication No.: US20220039254A1Publication Date: 2022-02-03
- Inventor: Jennifer ADAMCHUK , Gerard T. BUSS , Theresa M. BESOZZI
- Applicant: SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION
- Applicant Address: US OH Solon
- Assignee: SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION
- Current Assignee: SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION
- Current Assignee Address: US OH Solon
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H05K1/05 ; H05K1/09

Abstract:
The present disclosure relates to a dielectric substrate that may include a polyimide layer and a first filled polymer layer overlying the polyimide layer. The first filled polymer layer may include a resin matrix component, and a first ceramic filler component. The first ceramic filler component may include a first filler material. The first filler material may further have a mean particle size of at not greater than about 10 microns.
Public/Granted literature
- US11596064B2 Dielectric substrate and method of forming the same Public/Granted day:2023-02-28
Information query