- 专利标题: RETAINING RING DESIGN
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申请号: US17407052申请日: 2021-08-19
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公开(公告)号: US20220055181A1公开(公告)日: 2022-02-24
- 发明人: Aniruddh Jagdish Khanna , Daniel Redfield , Ehud Chatow , Kenneth Mason , Steven Turner , Rajeev Bajaj , Kieran Joseph Rynne , Periya G. Gopalan
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: B24B37/32
- IPC分类号: B24B37/32
摘要:
The present disclosure relates to retaining rings that include tunable chemical, material and structural properties, improved structural and fluid transport configurations and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a retaining ring with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure provide an advanced retaining ring that has discrete features and geometries, formed from at least two different materials that are formed from one or more polymers. The layers and/or regions of the advanced retaining ring may include a composite material structure, such as a polymer that contains at least one filler, such as metals, semimetal oxides, carbides, nitrides and/or polymer particles.
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