Invention Application
- Patent Title: PROCESSING APPARATUS AND PROCESSING METHOD
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Application No.: US17472920Application Date: 2021-09-13
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Publication No.: US20220081773A1Publication Date: 2022-03-17
- Inventor: Hiroki IRIUDA , Kuniyasu SAKASHITA
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP2020-156408 20200917
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/52 ; H01L21/02

Abstract:
A processing apparatus includes: a processing container having a substantially cylindrical shape; a gas nozzle extending in a longitudinal direction of the processing container along an inside of a side wall of the processing container; an exhaust body formed on the side wall on an opposite side of the processing container to face the processing gas nozzle; and an adjustment gas nozzle configured to eject a concentration adjustment gas toward a center of the processing container. The adjustment gas nozzle is provided within an angle range in which the exhaust body is formed at a central angle with reference to the center of the processing container in a plan view from the longitudinal direction.
Public/Granted literature
- US11859285B2 Processing apparatus and processing method Public/Granted day:2024-01-02
Information query
IPC分类: