Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE, AND METHOD
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Application No.: US17612679Application Date: 2020-05-05
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Publication No.: US20220082953A1Publication Date: 2022-03-17
- Inventor: Matthew LIPSON , Satish ACHANTA , Benjamin David DAWSON , Matthew Anthony SORNA , IIiya SIGAL , Tammo UITTERDIJK
- Applicant: ASML HOLDING N.V , ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven; NL Veldhoven
- Assignee: ASML HOLDING N.V,ASML NETHERLANDS B.V.
- Current Assignee: ASML HOLDING N.V,ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven; NL Veldhoven
- International Application: PCT/EP2020/062463 WO 20200505
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.
Public/Granted literature
- US11988971B2 Lithographic apparatus, substrate table, and method Public/Granted day:2024-05-21
Information query
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