- 专利标题： LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE, AND METHOD
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申请号： US17612679申请日： 2020-05-05
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公开(公告)号： US20220082953A1公开(公告)日： 2022-03-17
- 发明人: Matthew LIPSON , Satish ACHANTA , Benjamin David DAWSON , Matthew Anthony SORNA , IIiya SIGAL , Tammo UITTERDIJK
- 申请人： ASML HOLDING N.V , ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven; NL Veldhoven
- 专利权人： ASML HOLDING N.V,ASML NETHERLANDS B.V.
- 当前专利权人： ASML HOLDING N.V,ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven; NL Veldhoven
- 国际申请： PCT/EP2020/062463 WO 20200505
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.
公开/授权文献
- US11988971B2 Lithographic apparatus, substrate table, and method 公开/授权日：2024-05-21
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