公开(公告)号：US20190332015A1

公开(公告)日：2019-10-31

申请号：US16315125

申请日：2017-07-06

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Thomas POIESZ ,  Satish ACHANTA ,  Mehmet Ali AKBAS ,  Pavlo ANTONOV ,  Jeroen BOUWKNEGT ,  Joost Wilhelmus Maria FRENKEN ,  Evelyn Wallis PACITTI ,  Nicolaas TEN KATE ,  Bruce TIRRI ,  Jan VERHOEVEN

IPC分类号： G03F7/20 ,  H01L21/687

摘要： There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

公开(公告)号：US20220082953A1

公开(公告)日：2022-03-17

申请号：US17612679

申请日：2020-05-05

申请人： ASML HOLDING N.V ,  ASML NETHERLANDS B.V.

发明人： Matthew LIPSON ,  Satish ACHANTA ,  Benjamin David DAWSON ,  Matthew Anthony SORNA ,  IIiya SIGAL ,  Tammo UITTERDIJK

IPC分类号： G03F7/20

摘要： A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

公开(公告)号：US20210053177A1

公开(公告)日：2021-02-25

申请号：US16963576

申请日：2019-01-24

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Bert Dirk SCHOLTEN ,  Satish ACHANTA ,  Aydar AKCHURIN ,  Pavlo ANTONOV ,  Coen Hubertus Matheus BALTIS ,  Jeroen BOUWKNEGT ,  Ann-Sophie m. FARLE ,  Christopher John MASON ,  Ralph Nicholas PALERMO ,  Thomas POIESZ ,  Yuri Johannes Gabriel VAN DE VIJVER ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC分类号： B24B27/033 ,  B24B1/04 ,  B24B7/07 ,  B24B7/22 ,  G03F7/20 ,  H01L21/304

摘要： A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.

公开(公告)号：US20210223696A1

公开(公告)日：2021-07-22

申请号：US16334381

申请日：2017-08-23

申请人： ASML Netherlands B.V.

发明人： Satish ACHANTA ,  Wilhelmus Jacobus Johannes WELTERS ,  Abraham Alexander SOETHOUDT ,  Jelmer Mattheüs KAMMINGA ,  Christian LIEDECKE

IPC分类号： G03F7/16 ,  C23C16/458 ,  H01L21/67 ,  H01L21/687

摘要： A substrate, a substrate holder, a substrate coating apparatus, a method for coating the substrate and a method for removing the coating. A monomolecular layer is applied to the backside of the substrate or a clamp surface of the substrate holder. The friction force between the substrate backside and the substrate is small when the substrate does not experience full clamping force. After loading the substrate on the substrate holder full clamping force is exerted in order to fix the substrate. The clamping force causes local removal of the monomolecular layer, resulting in an increase of the friction force between the substrate and the substrate holder.

公开(公告)号：US20160018744A1

公开(公告)日：2016-01-21

申请号：US14772721

申请日：2014-02-26

申请人： ASML NETHERLANDS B.V.

发明人： Raymond Wilhelmus Louis LAFARRE ,  Satish ACHANTA ,  Matteo FILIPPI ,  Yogesh KARADE ,  Antonius Johannes Maria NELLISSEN ,  Ronal VAN DER WILK ,  Hendrikus Christoffel Maria VAN DOREMALEN ,  Wilhelmus Jacobus Johannes WELTERS

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70708

摘要： A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

摘要翻译： 一种制造用于光刻设备的物体保持器的方法，所述物体保持器包括一个或多个电功能部件，所述方法包括：使用包括与所述物体保持器的主体不同的载体片的复合结构和层状结构 包括一个或多个层并形成在载体片上; 将复合结构连接到主体的表面，使得层状结构位于载体片和主体的表面之间; 并从复合结构中移除载体片，使分层结构连接到主体。

公开(公告)号：US20200292947A1

公开(公告)日：2020-09-17

申请号：US16758917

申请日：2018-10-11

申请人： ASML NETHERLANDS B.V.

发明人： Thomas POIESZ ,  Satish ACHANTA ,  Jeroen BOUWKNEGT ,  Abraham Alexander SOETHOUDT

IPC分类号： G03F7/20

摘要： A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.

公开(公告)号：US20180308740A1

公开(公告)日：2018-10-25

申请号：US15766740

申请日：2016-09-08

申请人： ASML NETHERLANDS B.V.

发明人： Satish ACHANTA ,  Tiannan GUAN ,  Raymond Wilhelmus Louis LAFARRE ,  Ilya MALAKHOVSKY ,  Bas Johannes Petrus ROSET ,  Siegfried Alexander TROMP ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC分类号： H01L21/687 ,  G03F7/20 ,  G03F7/00

CPC分类号： H01L21/68742 ,  G03F7/0002 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70783 ,  H01L21/683 ,  H01L21/6831 ,  H01L21/687 ,  H01L21/6875

摘要： A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.