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公开(公告)号：US20240361703A1
公开(公告)日：2024-10-31
申请号：US18769032
申请日：2024-07-10
发明人： Mohamed SWILLAM , Stephen ROUX , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Arie Jeffrey DEN BOEF
CPC分类号： G03F7/70633 , G02B6/1225 , G02B26/0833
摘要： A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.
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公开(公告)号：US12124173B2
公开(公告)日：2024-10-22
申请号：US17790344
申请日：2020-12-08
IPC分类号： G03F7/00
CPC分类号： G03F7/70625 , G03F7/70141 , G03F7/70633
摘要： A system includes an illumination system, an optical element, and a detector. The optical system is implemented on a substrate. The illumination system includes first and second sources and first and second generators. The illumination system generates a beam of radiation. The first and second sources generate respective first and second different wavelength bands. The first and second resonators are optically coupled to respective ones of the first and second sources and narrow respective ones of the first and second wavelength bands. The optical element directs the beam toward a target structure. The detector receives radiation from the target structure and to generate a measurement signal based on the received radiation.
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公开(公告)号：US11988971B2
公开(公告)日：2024-05-21
申请号：US17612679
申请日：2020-05-05
发明人： Matthew Lipson , Satish Achanta , Benjamin David Dawson , Matthew Anthony Sorna , Iliya Sigal , Tammo Uitterdijk
IPC分类号： G03F7/00
CPC分类号： G03F7/70716
摘要： A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.
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公开(公告)号：US11841628B2
公开(公告)日：2023-12-12
申请号：US17798040
申请日：2021-01-21
申请人： ASML Holding N.V.
CPC分类号： G03F9/7088 , G03F7/70633 , G03F9/7046 , G03F9/7049 , G03F9/7069
摘要： An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.
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公开(公告)号：US11803130B2
公开(公告)日：2023-10-31
申请号：US17633884
申请日：2020-08-05
发明人： Franciscus Godefridus Casper Bijnen , Muhsin Eralp , Simon Reinald Huisman , Arie Jeffrey Den Boef
IPC分类号： G03F9/00
CPC分类号： G03F9/7049 , G03F9/7069 , G03F9/7088
摘要： An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing Interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.
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6.发明授权公开(公告)号：US11789368B2
公开(公告)日：2023-10-17
申请号：US17764139
申请日：2020-09-14
申请人： ASML Holding N.V.
IPC分类号： G03F7/00
CPC分类号： G03F7/70191 , G03F7/7085 , G03F7/70091
摘要： A system (500) includes an illumination system (502), a lens element (506), and a detector (504). The illumination system generates a beam of radiation (510) having a first spatial intensity distribution (800) at a pupil plane (528) and a second spatial intensity distribution (900) at a plane of a target (514). The first spatial intensity distribution comprises an annular intensity profile (802) or an intensity profile corresponding to three or more beams. The lens element focuses the beam onto the target. The second spatial intensity distribution is a conjugate of the first intensity distribution and has an intensity profile corresponding to a central beam (902) and one or more side lobes (904) that are substantially isolated from the central beam. The central beam has a beam diameter of approximately 20 microns or less at the target. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation.
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公开(公告)号：US20230280660A1
公开(公告)日：2023-09-07
申请号：US18196108
申请日：2023-05-11
发明人： Sebastian Thomas BAUERSCHMIDT , Peter Maximilian GÖTZ , Patrick Sebastian UEBEL , Ronald Franciscus Herman HUGERS , Jan Adrianus BOER , Edwin Johannes Cornelis BOS , Andreas Johannes Antonius BROUNS , Vitaliy PROSYENTSOV , Paul William SCHOLTES - VAN EIJK , Paulus Antonius Andreas TEUNISSEN , Mahesh Upendra AJGAONKAR
CPC分类号： G03F7/70625 , G02B1/005 , G02B6/02 , G03F7/7065 , G01B11/27 , G01J1/4257 , G03F7/70525 , G01M11/30
摘要： A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF). The mode control system includes at least one detection unit configured to measure one or more parameters of radiation emitted from the broadband radiation source to generate measurement data, and a processing unit configured to evaluate mode purity of the radiation emitted from the broadband radiation source, from the measurement data. Based on the evaluation, the mode control system is configured to generate a control signal for optimization of one or more pump coupling conditions of the broadband radiation source. The one or more pump coupling conditions relate to the coupling of a pump laser beam with respect to a fiber core of the photonic crystal fiber.
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公开(公告)号：US20230266255A1
公开(公告)日：2023-08-24
申请号：US18012801
申请日：2021-06-09
发明人： Ilse VAN WEPEREN , Arjan Johannes Anton BEUKMAN , Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX
IPC分类号： G01N21/956
CPC分类号： G01N21/956 , G01N2021/95676
摘要： Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.
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公开(公告)号：US20230236519A1
公开(公告)日：2023-07-27
申请号：US18001258
申请日：2021-05-20
申请人： ASML Holding N.V.
发明人： Yuli VLADIMIRSKY , Lev RYZHIKOV
CPC分类号： G03F9/7011 , G03F9/7065 , G03F9/7042 , G02B3/005
摘要： A patterning device pre-alignment sensor system is disclosed. The system comprises at least one illumination source configured to provide an incident beam along a normal direction towards a patterning device. The system further comprises an object lens group channel along the normal direction configured to receive a 0th order refracted beam from the patterning device. The system further comprises a first light reflector configured to redirect the 0th order refracted beam to form a first retroreflected beam. The system further comprises a first image lens group channel configured to transmit the first retroreflected beam to a first light sensor. The first light sensor is configured to detect the first retroreflected beam to determine a location feature of the patterning device.
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公开(公告)号：US20230213868A1
公开(公告)日：2023-07-06
申请号：US18012308
申请日：2021-06-04
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/7085 , G03F7/70275
摘要： A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light 5 beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.
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