- 专利标题: CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD
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申请号: US17497384申请日: 2021-10-08
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公开(公告)号: US20220115203A1公开(公告)日: 2022-04-14
- 发明人: Kaori BIZEN , Ryota WATANABE , Yuzuru MIZUHARA , Daisuke BIZEN
- 申请人: Hitachi High-Tech Corporation
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Tech Corporation
- 当前专利权人: Hitachi High-Tech Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2020-171001 20201009
- 主分类号: H01J37/24
- IPC分类号: H01J37/24 ; H01J37/147 ; H01J37/244 ; H01J37/22 ; H01J37/28
摘要:
A charged particle beam apparatus acquires an image that is not affected by movement of a stage at a high speed. The apparatus includes: a charged particle source for irradiating a sample with a charged particle beam; a stage on which the sample is placed; a measurement unit for measuring a movement amount of the stage; a deflector; a deflector offset control unit, which is a feedback control unit for adjusting a deflection amount of the deflector according to the movement amount of the stage; a plurality of detectors for detecting secondary charged particles emitted from the sample by irradiation of the charged particle beam; a composition ratio calculation unit that calculates composition ratios of signals output from the detectors based on the deflection amount adjusted by the feedback control unit; and an image generation unit for generating a composite image by compositing the signals using the composition ratio.
公开/授权文献
- US11610756B2 Charged particle beam apparatus and control method 公开/授权日:2023-03-21
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