Invention Application
- Patent Title: CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD
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Application No.: US17497384Application Date: 2021-10-08
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Publication No.: US20220115203A1Publication Date: 2022-04-14
- Inventor: Kaori BIZEN , Ryota WATANABE , Yuzuru MIZUHARA , Daisuke BIZEN
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2020-171001 20201009
- Main IPC: H01J37/24
- IPC: H01J37/24 ; H01J37/147 ; H01J37/244 ; H01J37/22 ; H01J37/28

Abstract:
A charged particle beam apparatus acquires an image that is not affected by movement of a stage at a high speed. The apparatus includes: a charged particle source for irradiating a sample with a charged particle beam; a stage on which the sample is placed; a measurement unit for measuring a movement amount of the stage; a deflector; a deflector offset control unit, which is a feedback control unit for adjusting a deflection amount of the deflector according to the movement amount of the stage; a plurality of detectors for detecting secondary charged particles emitted from the sample by irradiation of the charged particle beam; a composition ratio calculation unit that calculates composition ratios of signals output from the detectors based on the deflection amount adjusted by the feedback control unit; and an image generation unit for generating a composite image by compositing the signals using the composition ratio.
Public/Granted literature
- US11610756B2 Charged particle beam apparatus and control method Public/Granted day:2023-03-21
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