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公开(公告)号：US20210272770A1
公开(公告)日：2021-09-02
申请号：US17255724
申请日：2018-07-02
发明人： Yasunari SOHDA , Kaori BIZEN , Yusuke ABE , Kenji TANIMOTO
IPC分类号： H01J37/28 , H01J37/12 , H01J37/244 , H01J37/153 , H01J37/21 , H01J37/26 , H01J37/147
摘要： Provided is a scanning electron microscope which can perform high-speed focus correction even when an electron beam having high energy is used. The scanning electron microscope includes an electron optical system including an electron source 100 that emits an electron beam and an objective lens 113, a sample stage 1025 which is disposed on a stage 115 and on which a sample 114 is placed, a backscattered electron detector 1023 which is disposed between the objective lens and the sample stage and is configured to detect backscattered electrons 1017 emitted due to interaction between the electron beam and the sample, a backscattered electron detection system control unit 138 which is provided corresponding to the backscattered electron detector and is configured to apply a voltage to the backscattered electron detector, and a device control calculation device 146. The objective lens has an opening in a stage direction, and the device control calculation device performs focus correction of the electron beam by controlling the voltage applied to the backscattered electron detector from the backscattered electron detection system control unit.
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公开(公告)号：US20210313140A1
公开(公告)日：2021-10-07
申请号：US17210805
申请日：2021-03-24
IPC分类号： H01J37/244 , H01J37/28 , H01J37/22
摘要： A charged particle beam device capable of generating an image having uniform image quality in a field of view is provided. The charged particle beam device includes: a beam source configured to irradiate a sample with a charged particle beam; a diaphragm including an opening used for angle discrimination of secondary charged particles emitted from the sample; a first detector provided closer to the sample than the diaphragm, and configured to detect a part of the secondary charged particles; a second detector provided closer to the beam source than the diaphragm, and configured to detect secondary charged particles passing through the opening; an image generation unit configured to generate an image based on a first signal output from the first detector or a second signal output from the second detector; and a composite ratio calculation unit configured to calculate a composite ratio for each position in a field of view based on the first signal or the second signal with respect to a calibration sample that is a sample having a flat surface. The image generation unit generates a composite image by synthesizing the first signal and the second signal with respect to an observation sample using the composite ratio.
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公开(公告)号：US20220115203A1
公开(公告)日：2022-04-14
申请号：US17497384
申请日：2021-10-08
发明人： Kaori BIZEN , Ryota WATANABE , Yuzuru MIZUHARA , Daisuke BIZEN
IPC分类号： H01J37/24 , H01J37/147 , H01J37/244 , H01J37/22 , H01J37/28
摘要： A charged particle beam apparatus acquires an image that is not affected by movement of a stage at a high speed. The apparatus includes: a charged particle source for irradiating a sample with a charged particle beam; a stage on which the sample is placed; a measurement unit for measuring a movement amount of the stage; a deflector; a deflector offset control unit, which is a feedback control unit for adjusting a deflection amount of the deflector according to the movement amount of the stage; a plurality of detectors for detecting secondary charged particles emitted from the sample by irradiation of the charged particle beam; a composition ratio calculation unit that calculates composition ratios of signals output from the detectors based on the deflection amount adjusted by the feedback control unit; and an image generation unit for generating a composite image by compositing the signals using the composition ratio.
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