公开(公告)号：US20220246394A1

公开(公告)日：2022-08-04

申请号：US17594656

申请日：2019-05-08

Applicant: Hitachi High-Tech Corporation

Inventor： Fumiya ISHIZAKA ,  Daisuke BIZEN ,  Makoto SUZUKI

IPC: H01J37/28

Abstract: The present disclosure provides a technique enabling accurate ascertaining of a charged state of a resist pattern resulting from irradiation of a charged particle beam. The present disclosure provides a charged particle beam system provided with: a charged particle device provided with a charged particle source, deflectors for causing a primary charged particle beam emitted from the charged particle source to be scanned over a sample, an energy discriminator for performing energy discrimination for secondary electrons emitted when the primary charged particle beam has reached the sample, and a detector for detecting secondary electrons which have passed the energy discriminator; and a computer system for generating a scan image on the basis of signal amounts detected by the detector, which fluctuate during scanning of primary charged particles by the deflectors, and storing the scan image into an image storage unit. The computer system generates a scan image for each frame at the time of frame integration of the scan image, calculates an amount of static build-up in each frame on the basis of the output of the scan image of each frame, and outputs information on the amount of static build-up.

公开(公告)号：US20230273254A1

公开(公告)日：2023-08-31

申请号：US18026718

申请日：2020-09-30

Applicant: Hitachi High-Tech Corporation

Inventor： Shota MITSUGI ,  Yohei NAKAMURA ,  Daisuke BIZEN ,  Junichi FUSE ,  Satoshi TAKADA ,  Natsuki TSUNO

IPC: G01R31/265

CPC classification number: G01R31/2653 ,  G01R31/2656

Abstract: A control device controls a contact probe in synchronization with a pulse-controlled light having a predetermined wavelength, a measurement instrument measures a characteristic of a sample to be inspected or an analysis sample, and a circuit constant or a defect structure of the sample to be inspected is estimated based on a circuit model created by an electric characteristic analysis device configured to generate the circuit model based on a value measured by the measurement instrument and a detection signal of secondary electrons detected by the charged particle beam device.

公开(公告)号：US20220115203A1

公开(公告)日：2022-04-14

申请号：US17497384

申请日：2021-10-08

Applicant: Hitachi High-Tech Corporation

Inventor： Kaori BIZEN ,  Ryota WATANABE ,  Yuzuru MIZUHARA ,  Daisuke BIZEN

IPC: H01J37/24 ,  H01J37/147 ,  H01J37/244 ,  H01J37/22 ,  H01J37/28

Abstract: A charged particle beam apparatus acquires an image that is not affected by movement of a stage at a high speed. The apparatus includes: a charged particle source for irradiating a sample with a charged particle beam; a stage on which the sample is placed; a measurement unit for measuring a movement amount of the stage; a deflector; a deflector offset control unit, which is a feedback control unit for adjusting a deflection amount of the deflector according to the movement amount of the stage; a plurality of detectors for detecting secondary charged particles emitted from the sample by irradiation of the charged particle beam; a composition ratio calculation unit that calculates composition ratios of signals output from the detectors based on the deflection amount adjusted by the feedback control unit; and an image generation unit for generating a composite image by compositing the signals using the composition ratio.

公开(公告)号：US20230253180A1

公开(公告)日：2023-08-10

申请号：US18015605

申请日：2020-09-18

Applicant: Hitachi High-Tech Corporation

Inventor： Daisuke BIZEN ,  Natsuki TSUNO ,  Yasuhiro SHIRASAKI ,  Yohei NAKAMURA ,  Satoshi TAKADA

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/244

Abstract: A charged particle optical system scans a sample with a pulsed charged particle beam and detects secondary charged particles; and a scan image is formed. Control is carried out so that a deflection signal for deflecting the charged particle beam in a first direction, a first timing for pulsed irradiation, a second timing for pulsed irradiation, and a third timing for detection of the secondary charged particles are synchronized. When the deflection amount of the charged particle beam in the time period of the first timing corresponds to the coordinates of n pixels in the scan image, the same line is scanned m times (m

公开(公告)号：US20200321189A1

公开(公告)日：2020-10-08

申请号：US16810969

申请日：2020-03-06

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki YOKOSUKA ,  Hirohiko KITSUKI ,  Daisuke BIZEN ,  Makoto SUZUKI ,  Yusuke ABE ,  Kenji YASUI ,  Mayuka OSAKI ,  Hideyuki KAZUMI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22

Abstract: The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.

公开(公告)号：US20230095456A1

公开(公告)日：2023-03-30

申请号：US17909876

申请日：2020-03-30

Applicant: Hitachi High-Tech Corporation

Inventor： Daisuke BIZEN ,  Kei SAKAI ,  Junichi KAKUTA ,  Masumi SHIRAI ,  Minoru YAMAZAKI

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244 ,  G06T7/13

Abstract: Roughness measurement corrects a machine difference utilizing first PSD data indicating power spectral density of a line pattern measured for a line pattern formed on a wafer for machine difference management by a reference machine in roughness index calculation and second PSD data indicating power spectral density of a line pattern measured for the line pattern formed on the wafer for machine difference management by a correction target machine are used to obtain a correction method for correcting the power spectral density of the second PSD data to the power spectral density of the first PSD data, power spectral density of a line pattern is measured as third PSD data from a scanning image of the line pattern, and corrected power spectral density obtained by correcting the power spectral density of the third PSD data by the obtained correction method is calculated.

公开(公告)号：US20220216032A1

公开(公告)日：2022-07-07

申请号：US17610908

申请日：2019-05-21

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Minami SHOUJI ,  Natsuki TSUNO ,  Hiroya OHTA ,  Daisuke BIZEN ,  Hajime KAWANO

IPC: H01J37/22 ,  H01J37/244

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of acquiring an observation image having a high contrast in a sample whose light absorption characteristic depends on a light wavelength. The charged particle beam apparatus according to the invention irradiates the sample with light, generates an observation image of the sample, changes an irradiation intensity per unit time of the light, and then generates a plurality of the observation images having different contrasts (see FIG. 4).

公开(公告)号：US20210404801A1

公开(公告)日：2021-12-30

申请号：US17290018

申请日：2018-11-05

Applicant: Hitachi High-Tech Corporation

Inventor： Ayumi DOI ,  Makoto SUZUKI ,  Daisuke BIZEN ,  Shunsuke MIZUTANI

IPC: G01B21/18 ,  H01J37/28 ,  G01B15/04

Abstract: The present disclosure pertains to a method, a system, and a computer-readable medium for highly precisely measuring the depth of a recess formed in a sample even when, inter alia, the material or pattern density of the sample differs. In order to achieve the purpose described above, there are proposed a method, a measurement system, and a non-temporary computer-readable medium for storing program commands that can be executed by a computer system, the method, system, and medium involving: using a measurement tool to acquire an image or a brightness distribution of a region including a recess formed in a sample; extracting a first characteristic of the interior of the recess, and a second characteristic pertaining to the dimensions or area of the recess, from the acquired image or brightness distribution; and inputting the extracted first characteristic and second characteristic to a model that indicates the relationship between the first characteristic, the second characteristic, and a depth index of the recess to thereby derive the depth index of the recess.

公开(公告)号：US20210313140A1

公开(公告)日：2021-10-07

申请号：US17210805

申请日：2021-03-24

Applicant: Hitachi High-Tech Corporation

Inventor： Kaori BIZEN ,  Yuzuru MIZUHARA ,  Minoru YAMAZAKI ,  Daisuke BIZEN ,  Noritsugu TAKAHASHI

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/22

Abstract: A charged particle beam device capable of generating an image having uniform image quality in a field of view is provided. The charged particle beam device includes: a beam source configured to irradiate a sample with a charged particle beam; a diaphragm including an opening used for angle discrimination of secondary charged particles emitted from the sample; a first detector provided closer to the sample than the diaphragm, and configured to detect a part of the secondary charged particles; a second detector provided closer to the beam source than the diaphragm, and configured to detect secondary charged particles passing through the opening; an image generation unit configured to generate an image based on a first signal output from the first detector or a second signal output from the second detector; and a composite ratio calculation unit configured to calculate a composite ratio for each position in a field of view based on the first signal or the second signal with respect to a calibration sample that is a sample having a flat surface. The image generation unit generates a composite image by synthesizing the first signal and the second signal with respect to an observation sample using the composite ratio.

公开(公告)号：US20240363306A1

公开(公告)日：2024-10-31

申请号：US18771126

申请日：2024-07-12

Applicant: Hitachi High-Tech Corporation

Inventor： Minami SHOUJI ,  Natsuki TSUNO ,  Hiroya OHTA ,  Daisuke BIZEN ,  Hajime KAWANO

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/226 ,  H01J37/244

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of acquiring an observation image having a high contrast in a sample whose light absorption characteristic depends on a light wavelength. The charged particle beam apparatus according to the invention irradiates the sample with light, generates an observation image of the sample, changes an irradiation intensity per unit time of the light, and then generates a plurality of the observation images having different contrasts.