Invention Application
- Patent Title: SUBSTRATE STRUCTURE, SEMICONDUCTOR PACKAGE STRUCTURE AND METHOD FOR MANUFACTURING A SUBSTRATE STRUCTURE
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Application No.: US17066407Application Date: 2020-10-08
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Publication No.: US20220115288A1Publication Date: 2022-04-14
- Inventor: You-Lung YEN , Bernd Karl APPELT , Kay Stefan ESSIG
- Applicant: Advanced Semiconductor Engineering, Inc.
- Applicant Address: TW Kaohsiung
- Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee Address: TW Kaohsiung
- Main IPC: H01L23/31
- IPC: H01L23/31 ; H01L23/00 ; H01L21/56

Abstract:
A substrate structure, a semiconductor package structure including the same and a method for manufacturing the same are provided. The substrate structure includes a first passivation layer, a first circuit layer and a first protection layer. The first passivation layer has a first surface and a second surface opposite to the first surface. The first circuit layer has an outer lateral surface. A first portion of the first circuit layer is disposed in the first passivation layer. The first protection layer is disposed on a second portion of the first circuit layer and exposed from the first surface of the first passivation layer. The outer lateral surface of the first circuit layer is covered by the first passivation layer or the first protection layer.
Public/Granted literature
- US11545406B2 Substrate structure, semiconductor package structure and method for manufacturing a substrate structure Public/Granted day:2023-01-03
Information query
IPC分类: