- 专利标题: ARRAY SUBSTRATE, METHOD FOR PREPARING ARRAY SUBSTRATE, AND BACKLIGHT MODULE
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申请号: US17281015申请日: 2020-01-03
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公开(公告)号: US20220123024A1公开(公告)日: 2022-04-21
- 发明人: Zhanfeng CAO , Yingwei LIU , Ke WANG , Guocai ZHANG , Jianguo WANG , Zhiwei LIANG , Haixu LI , Muxin DI
- 申请人: BOE Technology Group Co., Ltd.
- 申请人地址: CN Beijing
- 专利权人: BOE Technology Group Co., Ltd.
- 当前专利权人: BOE Technology Group Co., Ltd.
- 当前专利权人地址: CN Beijing
- 国际申请: PCT/CN2020/070325 WO 20200103
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; H01L27/15
摘要:
An array substrate, a method for preparing the array substrate, and a backlight module are disclosed. Before electroplating a first metal layer on a pattern of a seed layer, the method further includes: forming a pattern of a compensation electrode wire electrically connected with a lead electrode on a side, where the lead electrode is formed, of a base substrate. The compensation electrode wire is at least on a second side of a wiring region, the pattern of the lead electrode is formed at a first side of the wiring region, and the first side and the second side are different sides. In the electroplating process, the lead electrode is connected with a negative pole of a power supply, the compensation electrode wire is electrically connected with the lead electrode, thus an area of an electroplating negative pole generating electric field lines is increased by utilizing the compensation electrode wire.
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