Invention Application
- Patent Title: COPPER PLATING STRUCTURE AND PACKAGE STRUCTURE INCLUDING THE SAME
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Application No.: US17131771Application Date: 2020-12-23
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Publication No.: US20220130751A1Publication Date: 2022-04-28
- Inventor: Ming-Huei Yen , Wen-Jin Li , Zi-Ting Lin , Yu-Ling Chang
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Priority: TW109137312 20201027
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/373 ; B32B15/01 ; B32B15/20

Abstract:
A copper plating structure and a package structure including the same are provided, and the copper plating structure includes at least one first copper layer and at least one second copper layer. The first copper layer includes a (111) crystal plane, wherein a proportion of the (111) crystal plane in each of the first copper layers is 36% to 100%. The second copper layer is located on the first copper layer and includes a non-(111) crystal plane or includes a (111) crystal plane and a non-(111) crystal plane, wherein a proportion of the (111) crystal plane in each of the second copper layers is 0% to 57%.
Information query
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