Invention Application
- Patent Title: FIELD-EFFECT TRANSISTOR, METHOD FOR MANUFACTURING SAME, AND WIRELESS COMMUNICATION DEVICE
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Application No.: US17428665Application Date: 2020-02-13
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Publication No.: US20220131097A1Publication Date: 2022-04-28
- Inventor: Shota Kawai , Hiroji Shimizu , Seiichiro Murase
- Applicant: Toray Industries, Inc.
- Applicant Address: JP Tokyo
- Assignee: Toray Industries, Inc.
- Current Assignee: Toray Industries, Inc.
- Current Assignee Address: JP Tokyo
- Priority: JP2019-029188 20190221
- International Application: PCT/JP2020/005522 WO 20200213
- Main IPC: H01L51/10
- IPC: H01L51/10 ; H01L51/05 ; H01L51/00

Abstract:
A field-effect transistor comprises, on a substrate, a source electrode, a drain electrode, and a gate electrode; a semiconductor layer in contact with the source electrode and the drain electrode; wires individually electrically connected to the source electrode and the drain electrode; and a gate insulating layer that insulates the semiconductor layer from the gate electrode, wherein a connecting portion between the source electrode and the wire forms a continuous phase, and a connecting portion between the drain electrode and the wire forms a continuous phase, the portions constituting the continuous phases contain at least an electrically conductive component and an organic component, and integrated values of optical reflectance at a region of a wavelength of 600 nm or more and 900 nm or less on the wires are higher than integrated values of optical reflectance at a region of a wavelength of 600 nm or more and 900 nm or less on the source electrode and the drain electrode.
Public/Granted literature
- US11711929B2 Field-effect transistor, method for manufacturing same, and wireless communication device Public/Granted day:2023-07-25
Information query
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