Invention Application
- Patent Title: APPARATUS FOR ROTATING SUBSTRATES
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Application No.: US16952979Application Date: 2020-11-19
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Publication No.: US20220157643A1Publication Date: 2022-05-19
- Inventor: Giridhar KAMESH , Vinodh RAMACHANDRAN , Chaitanya A. PRASAD , Mohammad AAMIR , Daniel C. GLOVER
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/02 ; H01L21/311

Abstract:
Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.
Public/Granted literature
- US12165907B2 Apparatus for rotating substrates Public/Granted day:2024-12-10
Information query
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