Invention Application
- Patent Title: WIRING SUBSTRATE AND SEMICONDUCTOR DEVICE
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Application No.: US17526089Application Date: 2021-11-15
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Publication No.: US20220157697A1Publication Date: 2022-05-19
- Inventor: Hiroshi TANEDA , Kei IMAFUJI , Yoshiki AKIYAMA , Kensuke UCHIDA
- Applicant: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Applicant Address: JP Nagano-ken
- Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee Address: JP Nagano-ken
- Priority: JP2020-190401 20201116
- Main IPC: H01L23/498
- IPC: H01L23/498

Abstract:
A wiring substrate includes a bendable portion including one or more wiring layers and insulation layers that are alternately stacked. The insulation layers of the bendable portion include a first insulation layer and a second insulation layer. The first insulation layer is located at an inner bent position of the bendable portion when the bendable portion is bent. The second insulation layer is located at an outer bent position of the bendable portion relative to the first insulation layer when the bendable portion is bent. The first insulation layer has a higher elastic modulus than the second insulation layer.
Public/Granted literature
- US12057384B2 Wiring substrate and semiconductor device Public/Granted day:2024-08-06
Information query
IPC分类: