Invention Application
- Patent Title: METHOD AND DEVICE FOR FORMING HEXAGONAL BORON NITRIDE FILM
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Application No.: US17438132Application Date: 2020-02-19
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Publication No.: US20220165568A1Publication Date: 2022-05-26
- Inventor: Nobutake KABUKI , Masahito SUGIURA , Takashi MATSUMOTO , Kenjiro KOIZUMI , Ryota IFUKU
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Priority: JP2019-048333 20190315
- International Application: PCT/JP2020/006483 WO 20200219
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/34 ; C23C16/505 ; H01J37/32
Abstract:
A method for forming a hexagonal boron nitride film comprises: providing a substrate; and generating plasma of a boron-containing gas and a nitrogen-containing gas in a plasma generation region located at a position apart from the substrate to form the hexagonal boron nitride film on the surface of the substrate by plasma CVD using plasma diffused from the plasma generation region.
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